Hybrid MBC Transistor Layout for Speed-Current Tradeoffs

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Solution Overview

Problem

Existing multi-gate MOSFETs, such as MBC transistors, face challenges in achieving optimal performance for both high-speed and high-current applications due to variations in channel member configurations, which affect parasitic capacitance and on-state current.

Innovation Solution

A method for forming hybrid semiconductor devices with MBC transistors having different numbers of channel members, involving selective ion implantation, epitaxial deposition of channel and sacrificial layers, and patterning to create fin-shaped structures, allowing for tailored transistor configurations suitable for specific applications.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If MBC transistors are designed with more channel members to increase on-state current, then high-current application performance is improved, but parasitic capacitance increases and high-speed performance deteriorates

Engineering Contradiction:
Improveon-state currentVSAvoidparasitic capacitance
Core Design Contradiction:
PowerVSObject-generated harmful factors

Solution Approach 1:

The semiconductor device is divided into first and second regions, each containing MBC transistors with different numbers of channel members. The first region contains transistors with fewer channel members optimized for high-speed applications, while the second region contains transistors with more channel members optimized for high-current applications. This segmentation allows the device to simultaneously support both high-speed and high-current requirements without the parasitic capacitance of one type affecting the performance of the other.

Inventive Principle:
Principle #1Segmentation

2Speed

If MBC transistors are designed with fewer channel members to reduce parasitic capacitance, then high-speed application performance is improved, but on-state current decreases

Engineering Contradiction:
Improvehigh-speed performanceVSAvoidon-state current
Core Design Contradiction:
SpeedVSPower

Solution Approach 1:

Different regions of the semiconductor device are assigned different transistor configurations tailored to local performance requirements. The first region is optimized with fewer channel members for high-speed switching, while the second region is optimized with more channel members for high-current handling. This local quality approach ensures that each region performs optimally for its intended application without compromising overall device functionality.

Inventive Principle:
Principle #3Local quality

3Device complexity

If a single MBC transistor configuration is used, then device complexity is reduced, but adaptability to different applications deteriorates

Engineering Contradiction:
Improvetransistor configuration uniformityVSAvoidapplication-specific optimization
Core Design Contradiction:
Device complexityVSAdaptability or versatility

Solution Approach 1:

The semiconductor device achieves multi-functionality by integrating two types of MBC transistors with different channel member configurations within a single device structure. This allows the device to serve multiple application purposes - both high-speed switching and high-current handling - without requiring separate devices. The universal design enables the same substrate to support diverse transistor configurations optimized for different functional requirements.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the formation of transistors with improved performance characteristics, where 2-channel-member transistors excel in high-speed AC applications and 3-channel-member transistors in high-current applications, by managing parasitic capacitance and on-state current effectively.

Implementation Method 1

selective ion implantation

Methodology Applied
Scientific EffectIon implantation: Ion Implantation

Implementation Method 2

epitaxial deposition of channel and sacrificial layers

Methodology Applied
Scientific EffectEpitaxial deposition: Epitaxy

Data Source

PatentUS12170279B2Hybrid semiconductor device
Publication Date: 2024.12.17 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12170279B2 patent drawing
  • US12170279B2 patent drawing
  • US12170279B2 patent drawing

AI summary

Semiconductor devices and method of forming the same are provided. In one embodiment, a semiconductor device includes a first transistor and a second transistor. The first transistor includes two first source/drain features and a first number of nanostructures that are stacked vertically one over another and extend lengthwise between the two first source/drain features. The second transistor includes two second source/drain features and a second number of nanostructures that are stacked vertically one over another and extend lengthwise between the two second source/drain features.