Hybrid Nanosheet Row Layout for Single-Mask APR Placement
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Solution Overview
Problem
The manufacturing of integrated circuits (ICs) with nanosheet structures is challenging due to the complexity of aligning standard cells with power rails and reference rails, and the need for multiple masks to create point touch patterns, which increases costs.
Innovation Solution
The use of hybrid nanosheet structures with varying numbers of nanosheets in adjacent rows, arranged to have at least a 1× cell height, allowing for the use of a single immersion mask to simplify the manufacturing process and reduce costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If standard cells are aligned with power rails and reference rails in nanosheet structures, then circuit functionality is achieved, but manufacturing complexity increases due to the need for multiple masks and point touch patterns
Solution Approach 1:
The patent segments the nanosheet cell structures into distinct groups where each group contains nanosheets with the same number of sheets. By dividing the layout into these manageable segments, the manufacturing process can treat each segment uniformly, reducing the need for complex multi-mask alignment procedures while maintaining proper circuit functionality.
Solution Approach 2:
The patent applies local quality by allowing different regions of the layout to have different nanosheet configurations (different numbers of sheets in different groups) while maintaining uniform manufacturing rules within each group. This enables circuit functionality to be optimized locally in different areas without requiring global manufacturing complexity.
2Adaptability or versatility
If point touch patterns are used to create nanosheet structures, then circuit design flexibility is achieved, but manufacturing costs increase due to the need for multiple masks
Solution Approach 1:
The patent creates a universal manufacturing approach where a single mask design can produce multiple different nanosheet configurations by varying the group assignments. Instead of requiring separate masks for each point touch pattern variation, the same mask set can generate diverse circuit designs by changing which nanosheets are grouped together, achieving multi-functionality in the manufacturing process.
Solution Approach 2:
The patent inverts the traditional approach by not using multiple masks to create different patterns, but rather using a single mask pattern with different grouping strategies to achieve design flexibility. Instead of varying the mask to get different structures, the same mask produces different structures through alternative grouping arrangements.
3Productivity
If hybrid nanosheet structures with varying numbers of nanosheets are used in adjacent rows, then power, performance, and area (PPA) is improved, but alignment complexity with power rails increases
Solution Approach 1:
The patent applies preliminary action by pre-establishing uniform grouping rules for nanosheets before the actual manufacturing alignment process. By determining the grouping configuration in advance and maintaining consistency within each group, the alignment with power rails becomes a straightforward process of applying predetermined patterns rather than performing complex real-time adjustments, thus improving manufacturing precision.
Data Source
AI summary
A device including first nanosheet structures each including a first number of nanosheets, second nanosheet structures each including a second number of nanosheets that is different than the first number of nanosheets, and a plurality of rows including first rows and second rows. Where each of the first nanosheet structures is in a respective one of the first rows, each of the second nanosheet structures is in a respective one of the second rows, at least two of the first rows are adjacent one another, and at least two of the second rows are adjacent one another.