Hybrid Plasma Source With Resonant ICP-CCP Coupling
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Solution Overview
Problem
Conventional capacitively coupled plasma (CCP) systems offer superior flow field control but low molecular dissociation, while inductively coupled plasma (ICP) systems provide high dissociation but poor flow field control, limiting their applicability in various plasma processing applications.
Innovation Solution
A hybrid resonant capacitive-inductive plasma source that integrates a showerhead electrode for precise gas flow control with an inductive element to generate a magnetic field, forming a resonant circuit to sustain plasma, combining the advantages of both CCP and ICP systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If capacitively coupled plasma (CCP) system is used, then flow field control is improved, but molecular dissociation degree deteriorates
Solution Approach 1:
The patent combines capacitive and inductive coupling methods into a hybrid plasma source. The system uses both a capacitively coupled electrode structure and an inductively coupled coil structure simultaneously, merging the advantages of both methods to achieve both high molecular dissociation and good flow field control
Solution Approach 2:
The hybrid plasma source serves multiple functions: it provides molecular dissociation through inductive coupling while simultaneously maintaining flow field control through capacitive coupling with the showerhead electrode. This multi-functional design resolves the contradiction by making the system capable of both dissociation and control
2Quantity of substance
If inductively coupled plasma (ICP) system is used, then molecular dissociation degree is improved, but flow field control deteriorates
Solution Approach 1:
The patent merges inductive coupling for high dissociation with capacitive coupling through the showerhead electrode for flow field control. The hybrid structure integrates both coupling methods to overcome the limitation of poor flow control in conventional ICP systems
Solution Approach 2:
The showerhead electrode acts as an intermediary element that introduces gas flow control into the inductively coupled plasma system. It serves as a mediator between the inductive plasma source and the substrate, enabling uniform species distribution while maintaining high dissociation
3Quantity of substance
If inductive element is added to form resonant circuit, then plasma density is improved, but device complexity increases
Solution Approach 1:
The resonant circuit components (inductive element and capacitor) are merged with the existing plasma chamber structure. The inductive coil is positioned within the chamber and electrically connected to form a resonant circuit with the chamber walls, integrating the plasma generation function into the existing device architecture
Solution Approach 2:
The plasma chamber structure serves multiple functions: it contains the plasma, provides capacitive coupling for the resonant circuit, and supports the showerhead electrode. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The hybrid system enhances molecular dissociation, maintains high plasma density, achieves low electron energy, and narrows ion energy distribution, providing improved uniformity and control for plasma processing, suitable for a wider range of applications including plasma-enhanced atomic layer deposition and etching.
Implementation Method 1
an inductive element coupled to the RF feed structure configured to form a resonant circuit to generate a magnetic field to sustain the inductively coupled plasma generated within the capacitively coupled plasma chamber
Implementation Method 2
an inductive element coupled to the RF feed structure configured to form a resonant circuit to generate a magnetic field to sustain the inductively coupled plasma
Implementation Method 3
a showerhead electrode configured to control gas flow within the capacitively coupled plasma chamber
Data Source
AI summary
According to an embodiment, a hybrid plasma processing system for generating an inductively coupled plasma is proposed. The hybrid plasma processing system includes a plasma chamber, a showerhead electrode, an RF feed structure, and an inductive element. The plasma chamber includes a center electrode, showerhead, and a coaxial RF power feed. The plasma chamber is configured as a capacitively coupled plasma (CCP) chamber. The showerhead electrode is configured to control gas flow within the capacitively coupled plasma chamber. The showerhead electrode is coupled to ground. The RF feed structure is couplable to an RF source. The inductive element is coupled to the RF feed structure configured to form a resonant circuit to generate a magnetic field to sustain the inductively coupled plasma generated within the capacitively coupled plasma chamber.