Semiconductor Processing Tool With Hydrogen Outlet Arrays for EUV Tin Control
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Solution Overview
Problem
EUV lithography systems face performance degradation due to tin particle contamination on collectors, leading to reduced reflectivity and system downtime, despite existing hydrogen gas curtains and pumps that fail to fully prevent tin deposition.
Innovation Solution
Implementing a plurality of hydrogen outlets arrayed normal to the collector surface to enhance the hydrogen curtain, combined with a control device that adjusts flow rates based on tin contamination levels, using sensors and machine learning models to optimize hydrogen gas distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If hydrogen gas curtain and pumps are used to prevent tin deposition, then system reliability is improved, but tin particles still contaminate the collector and cause downtime
Solution Approach 1:
The invention divides the hydrogen gas delivery system into multiple outlets arrayed normal to the collector surface, creating segmented hydrogen curtains at different positions. This segmentation allows hydrogen to be delivered more effectively throughout the tin droplet flight path, preventing tin deposition on the collector while maintaining system reliability and reducing downtime.
Solution Approach 2:
The invention transitions from a single-plane hydrogen gas curtain to a multi-dimensional hydrogen distribution system by arraying multiple outlets normal to the collector surface. This creates hydrogen curtains in multiple spatial dimensions along the tin droplet trajectory, enhancing the protective effect against tin contamination.
2Reliability
If more hydrogen gas is used to increase curtain thickness, then tin particle protection is improved, but gas consumption and system complexity increase
Solution Approach 1:
By segmenting the hydrogen delivery into multiple outlets, the system achieves more effective tin particle protection with optimized gas distribution. Each outlet creates a localized hydrogen curtain, reducing overall gas consumption compared to a single large curtain while maintaining effective tin particle prevention.
Solution Approach 2:
The invention applies local quality by positioning hydrogen outlets at specific locations normal to the collector surface where tin droplets are most likely to impact. This localized approach ensures effective protection at critical points while minimizing unnecessary hydrogen gas consumption in other areas.
3Productivity
If multiple hydrogen outlets are arrayed normal to the collector surface, then tin particle removal efficiency is improved, but device complexity increases
Solution Approach 1:
The segmentation of hydrogen outlets into multiple discrete positions provides a systematic approach to managing complexity. Each outlet is identical and performs the same function, making the system easier to manufacture, assemble, and maintain while achieving enhanced tin particle removal efficiency and extended collector lifetime.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances collector lifetime and reduces downtime by effectively decelerating and removing airborne tin particles, maintaining system performance and throughput.
Implementation Method 1
a hydrogen curtain that decelerates the tin particles
Implementation Method 2
the hydrogen gas produces hydrogen radical, which can bind to tin that is on the reflector to form stannane
Data Source
AI summary
A plurality of hydrogen outlets are arrayed along a direction normal to a surface (such as a surface of a collector) of an extreme ultraviolet lithography (EUV) tool to increase a volume of hydrogen gas surrounding the surface. As a result, airborne tin is more likely to be stopped by the hydrogen gas surrounding the surface and less likely to bind to the surface. Fewer tin deposits results in increased lifetime for the surface, which reduces downtime for the EUV tool. Additionally, a control device may receive (e.g., from a camera and/or another type of sensor) an indication of levels of tin contamination on the surface and control flow rates to adjust a thickness of the hydrogen curtain. As a result, tin contamination on the collector is less likely to occur and will be more efficiently cleaned by the hydrogen gas, which results in increased lifetime for the surface and reduced downtime for the EUV tool.