Hydrogen Peroxide Delivery System for Semiconductor Processing
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Solution Overview
Problem
Existing methods for delivering hydrogen peroxide to semiconductor processing chambers face challenges such as inconsistent reactivity and safety risks due to varying evaporation rates of H2O and H2O2, and high temperatures leading to reduced H2O2 delivery and reactivity.
Innovation Solution
A system and method involving an evaporator heated to less than 120°C to evaporate an aqueous hydrogen peroxide solution, maintaining a consistent H2O2 concentration, and using a heated vapor feed line with a filter to ensure high reactivity and safety, while minimizing decomposition and particle contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the evaporator is heated to high temperatures to evaporate the aqueous hydrogen peroxide solution, then the evaporation rate increases, but the hydrogen peroxide decomposes and reactivity decreases
Solution Approach 1:
The patent changes the temperature parameter from conventional high temperatures to a specific low temperature range (below 120°C, preferably 80-110°C). This parameter change enables evaporation to occur at controlled rates while preserving hydrogen peroxide reactivity and preventing decomposition, thus resolving the contradiction between evaporation rate and reactivity maintenance.
Solution Approach 2:
The system dynamically controls the evaporator temperature within a specific range rather than using a fixed high temperature. The temperature can be adjusted based on process conditions to optimize both evaporation rate and hydrogen peroxide stability, allowing the system to adaptively balance productivity and reliability.
2Quantity of substance
If the evaporator is heated to high temperatures to increase evaporation, then more hydrogen peroxide vapor is produced, but safety risks increase due to potential decomposition and explosive conditions
Solution Approach 1:
By changing the temperature parameter to a lower range (below 120°C), the patent prevents hydrogen peroxide decomposition that could lead to explosive conditions. This parameter change maintains safe operating conditions while still producing sufficient vapor for effective processing, resolving the contradiction between vapor quantity and safety.
Solution Approach 2:
The patent converts the potential harm of high temperature decomposition into a benefit by deliberately operating at lower temperatures. This prevents the formation of harmful decomposition products and explosive conditions, transforming what would be a dangerous high-temperature process into a safe low-temperature process that still achieves effective hydrogen peroxide delivery.
3Productivity
If different heating rates are applied to H2O and H2O2 in the solution, then evaporation occurs, but the concentration of H2O2 becomes inconsistent over time
Solution Approach 1:
The patent changes the temperature parameter to a lower range where the differential evaporation rate between H2O and H2O2 is minimized. At these temperatures (below 120°C, preferably 80-110°C), both components evaporate at more comparable rates, maintaining consistent H2O2 concentration in the vapor phase and resolving the contradiction between evaporation efficiency and concentration stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Achieves consistent delivery of hydrogen peroxide with high reactivity, reducing safety risks and improving processing consistency by maintaining lower evaporator temperatures and using a filter to prevent particle contamination.
Implementation Method 1
evaporating an aqueous hydrogen peroxide solution in an evaporator heated to less than 120° C., thereby forming a hydrogen peroxide vapor
Implementation Method 2
The second feed line is provided with a second feed line heater configured to heat the feed line to a temperature within 20° C. of the temperature of the evaporator or to a temperature higher than the temperature of the evaporator
Data Source
AI summary
In some embodiments, a system is disclosed for delivering hydrogen peroxide to a semiconductor processing chamber. The system includes a process canister for holding a H2O2/H2O mixture in a liquid state, an evaporator provided with an evaporator heater, a first feed line for feeding the liquid H2O2/H2O mixture to the evaporator, and a second feed line for feeding the evaporated H2O2/H2O mixture to the processing chamber, the second feed line provided with a second feed line heater. The evaporator heater is configured to heat the evaporator to a temperature lower than 120° C. and the second feed line heater is configured to heat the feed line to a temperature equal to or higher than the temperature of the evaporator.