Hydrogen Peroxide Purification via Stabilizer-Protected Reverse Osmosis
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Aqueous hydrogen peroxide solutions produced by autoxidation contain high levels of residual impurities, including metals and organic compounds, which are difficult to purify below 1 mg/kg TOC and 0.05 mg/kg TN, leading to contamination in semiconductor production and safety risks due to metal impurities introduced by stainless steel reverse osmosis systems.
Innovation Solution
A process involving treatment with a reverse osmosis system, followed by stabilization with phosphates or pyrophosphates, and subsequent adsorption and ion exchange resin treatments to achieve low TOC, TN, and iron levels, using stainless steel reverse osmosis systems while preventing metal impurity introduction and ensuring stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If reverse osmosis system made of stainless steel is used to purify hydrogen peroxide solution, then purification efficiency is improved, but metal impurities (mainly iron) are introduced into the solution
Solution Approach 1:
The patent applies preliminary action by adding a stabilizer to the hydrogen peroxide solution before it enters the reverse osmosis system. This stabilizer forms a protective layer on the stainless steel surfaces, preventing metal impurities from leaching into the solution during the high-pressure reverse osmosis process, thus resolving the contradiction between purification efficiency and metal impurity introduction
Solution Approach 2:
The stabilizer acts as an intermediary substance between the stainless steel reverse osmosis system and the hydrogen peroxide solution. It mediates the interaction by forming a protective barrier that prevents direct contact and potential contamination, allowing the system to maintain both high purification efficiency and low metal impurity levels
2Manufacturing precision
If multiple purification steps are applied to reduce TOC and TN levels below 1 mg/kg and 0.05 mg/kg, then purity is improved, but process complexity increases
Solution Approach 1:
The patent merges multiple purification functions into a single integrated reverse osmosis system operated at high pressure. By combining filtration, separation, and stabilization functions in one step, it achieves the required purity levels (TOC < 1 mg/kg, TN < 0.05 mg/kg) without requiring multiple separate treatment stages, thus reducing overall process complexity while maintaining high purity
3Productivity
If high pressure is applied in reverse osmosis system, then purification performance is improved, but metal component pick-up from stainless steel increases
Solution Approach 1:
The stabilizer is added before the high-pressure reverse osmosis process to preemptively protect the stainless steel components. This preliminary protective measure allows the system to operate at high pressure for optimal purification performance without the detrimental effect of increased metal pick-up, as the stabilizer prevents metal leaching under high-pressure conditions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process delivers a highly pure aqueous hydrogen peroxide solution with TOC below 1 mg/kg, TN below 0.05 mg/kg, and iron below 0.00001 mg/kg, extending the lifespan of downstream purification equipment and ensuring safety, suitable for electronic applications.
Implementation Method 1
the treatment of an aqueous hydrogen peroxide solution with at least one first reverse osmosis system
Implementation Method 2
the treatment of the obtained hydrogen peroxide solution with at least one adsorption resin
Implementation Method 3
the treatment of the obtained hydrogen peroxide solution with at least one ion exchange resin
Data Source
AI summary
The invention relates to a process for the purification of an aqueous hydrogen peroxide solution comprising at least the following steps: (a) the treatment of an aqueous hydrogen peroxide solution with at least one first reverse osmosis system, (b) the treatment of the obtained hydrogen peroxide solution with at least one first stabilizer, (c) the treatment of the obtained hydrogen peroxide solution with at least one purification mean selected from adsorption resins, ion exchange resins, and combinations thereof. The invention also relates to the aqueous hydrogen peroxide solution obtainable thereby, and to the use thereof in the manufacture of microelectronic components and semiconductors.