Hydrogen Radical Reactor Coating for Uniform Substrate Cleaning
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Solution Overview
Problem
Existing methods for removing both carbon-based and oxygen-based contaminants from substrate surfaces during electronic device manufacturing are limited by equipment constraints, leading to non-uniform distribution of hydrogen radicals and contamination removal inefficiencies.
Innovation Solution
The use of a reactor system with a reaction chamber coated with a non-porous metal oxide coating, combined with a gas distribution apparatus featuring a manifold plate with radially extending gas channels, facilitates a more uniform distribution of hydrogen radicals across the substrate surface, effectively removing both carbon-based and oxygen-based contaminants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If fluorine radicals are used to remove oxygen-based contaminants, then oxygen-based contaminant removal is improved, but reactor component corrosion increases leading to particle generation
Solution Approach 1:
The patent introduces a remote plasma source as an intermediary device that generates hydrogen radicals at a distance from the substrate. This allows the reactive species to be delivered uniformly without direct contact between corrosive plasma and reactor components, thereby preventing corrosion while maintaining contaminant removal effectiveness.
Solution Approach 2:
The patent extracts the plasma generation function from the reaction chamber by using a remote plasma source. The plasma is generated in a separate region and then transported to the substrate area, separating the corrosive plasma generation process from the sensitive reaction environment.
2Duration of action of moving object
If quartz is used as reactor component material to mitigate hydrogen radical recombination, then hydrogen radical lifetime is improved, but temperature uniformity across substrate surface deteriorates
Solution Approach 1:
The remote plasma source acts as an intermediary that generates hydrogen radicals in a region optimized for radical lifetime (using quartz), then transports these radicals through a controlled path to the substrate. This separates the radical generation environment from the substrate processing environment, allowing optimal material selection in each zone.
3Device complexity
If hydrogen radicals enter showerhead at center region and transport horizontally to edge, then radical delivery is simplified, but substrate center-to-edge removal uniformity deteriorates
Solution Approach 1:
The patent changes the delivery geometry from horizontal transport in the showerhead to vertical/drooping transport from a remote plasma source. The showerhead is positioned at an angle (e.g., 45 degrees) relative to the substrate, creating a drooping flow pattern that naturally distributes radicals more uniformly across the substrate surface.
Solution Approach 2:
Instead of delivering radicals from the center outward through horizontal transport, the remote plasma source delivers radicals in a reversed pattern where the flow direction and distribution characteristics are inverted to achieve better uniformity. The showerhead orientation and radical flow path are reversed compared to conventional designs.
4Device complexity
If conventional showerhead design is used for hydrogen radical delivery, then equipment simplicity is improved, but hydrogen radical distribution uniformity deteriorates
Solution Approach 1:
The patent introduces a new spatial dimension by positioning the showerhead at an angle (e.g., 45 degrees) relative to the substrate rather than parallel. This angular orientation creates a drooping flow pattern that improves radical distribution uniformity while maintaining relatively simple equipment structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach extends the lifetime of hydrogen radicals, achieves a more uniform distribution, and enhances the efficiency of contaminant removal from substrate surfaces, addressing the limitations of prior art methods.
Implementation Method 1
A remote plasma source and a hydrogen source can be used to provide a source of hydrogen radicals
Implementation Method 2
at least a portion of the interior surface comprises a coating, such as a metal oxide coating
Data Source
AI summary
A system and method suitable for removing both carbon-based contaminants and oxygen-based contaminants from a substrate within a single process chamber are disclosed.