Atomic Hydrogen Sensor Filter for Lithography Plasma
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Solution Overview
Problem
Existing projection exposure apparatuses for semiconductor lithography face challenges in measuring the concentration of atomic hydrogen in a plasma without disrupting the operational vacuum, leading to measurement errors and reduced productivity.
Innovation Solution
A device with a filter element, configured to allow predominantly atomic hydrogen to pass through while blocking other plasma constituents, is integrated between the plasma region and the sensor, enabling continuous measurement during operation without deactivating the light source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If measurement methods such as heat flux measurements or etch rates are used to determine atomic hydrogen concentration, then measurement capability is provided, but measurement errors occur due to interference from ions H3+ and electrons e- in the plasma
Solution Approach 1:
The patent extracts only the atomic hydrogen component from the plasma mixture by using a filter element that selectively blocks ions H3+ and electrons e- while allowing atomic hydrogen to pass through. This extraction principle resolves the measurement accuracy problem by isolating the target measurement object from interfering substances.
Solution Approach 2:
The filter element acts as an intermediary between the plasma and the sensor, selectively filtering out interfering ions and electrons while permitting atomic hydrogen to reach the sensor. This intermediary mechanism ensures reliable and accurate measurement by preventing direct interference from other plasma constituents.
2Measurement precision
If the light source is deactivated to allow plasma decay for measurement, then measurement becomes possible, but productivity decreases due to loss of production time
Solution Approach 1:
The patent enables continuous measurement of atomic hydrogen concentration during normal production operation by using a filter element that allows measurement without deactivating the light source. This continuity principle resolves the contradiction by maintaining both production activity and measurement capability simultaneously.
Solution Approach 2:
The filter element serves as an intermediary that enables measurement during operation by blocking interfering plasma constituents while allowing atomic hydrogen to reach the sensor, thus eliminating the need to stop production for measurement.
3Measurement precision
If a filter element is introduced to selectively pass atomic hydrogen, then measurement accuracy improves, but device complexity increases
Solution Approach 1:
The filter element is positioned between the plasma region and the sensor, acting as an intermediary that selectively filters plasma constituents. This intermediary approach achieves high measurement accuracy while maintaining relatively simple device architecture by adding only one selective filtering component.
Solution Approach 2:
The filter element introduces local quality differentiation by having specific permeability properties for different plasma constituents at a localized position between the plasma and sensor, achieving selective filtration without complex system-wide modifications.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for accurate and continuous measurement of atomic hydrogen concentration, reducing measurement errors and enhancing the productivity of the projection exposure apparatus by enabling measurements to be taken during operation.
Implementation Method 1
the filter element is configured to predominantly allow the passage of atomic hydrogen from the plasma to the sensor
Data Source
AI summary
A projection exposure apparatus (1) for semiconductor lithography has a device for determining the concentration of atomic hydrogen in a plasma (29) in the region of an optical element (25, 25.1), wherein the device includes a sensor (32, 32.1, 32.2, 32.3, 32.4), In this case, the device includes a filter element (31, 31.1,31.2, 31.3, 31.4) arranged between the region of the plasma (29) and the sensor (32, 32.1, 32.2, 32.3, 32.4), wherein the filter element (31, 31.1,31.2, 31.3, 31.4) is configured to predominantly allow the passage of atomic hydrogen from the plasma (29) to the sensor (32, 32.1, 32.2, 32.3, 32.4).