Integrated Hydrogen Sensor Stack for Compact IC Embedding

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Solution Overview

Problem

Conventional hydrogen sensors are difficult to embed in integrated circuits due to their large size, making them unsuitable for compact semiconductor structures.

Innovation Solution

A novel hydrogen sensor structure is developed, comprising a carrier substrate with a hydrogen-free oxide layer and a metal oxide layer, where the hydrogen-free oxide layer is formed using in-situ steam generation, creating a hydrogen sensing interface with weak bonding and dangling bonds, allowing for efficient hydrogen detection without hydrogen atoms, and a protection layer to prevent moisture penetration.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If conventional hydrogen sensor structures are used, then hydrogen detection capability is achieved, but the sensor size becomes large and cannot be embedded in integrated circuits

Engineering Contradiction:
Improvesensor sizeVSAvoidhydrogen detection capability
Core Design Contradiction:
Volume of moving objectVSReliability

Solution Approach 1:

The hydrogen sensor is segmented into distinct functional layers: a hydrogen-free oxide layer (first oxide layer) and a metal oxide layer (second oxide layer). This segmentation allows each layer to perform its specific function efficiently while maintaining a compact overall structure that can be integrated into circuits.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the sensor structure are assigned different material properties: the hydrogen-free oxide layer provides a hydrogen-free environment with weak bonding for hydrogen absorption, while the metal oxide layer provides catalytic activity and electrical conductivity. This local differentiation of material properties enables effective hydrogen detection in a small volume.

Inventive Principle:
Principle #3Local quality

2Strength

If the hydrogen-free oxide layer is formed with strong bonding, then structural stability is improved, but hydrogen absorption capability at the interface decreases

Engineering Contradiction:
Improveinterface bonding strengthVSAvoidhydrogen sensing sensitivity
Core Design Contradiction:
StrengthVSMeasurement precision

Solution Approach 1:

The bonding strength at the hydrogen sensing interface is deliberately optimized to be weak rather than strong. This parameter change allows hydrogen atoms to be readily absorbed at the interface between the hydrogen-free oxide layer and metal oxide layer, creating dangling bonds that enhance hydrogen sensing sensitivity while maintaining sufficient structural stability for device operation.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables a smaller size hydrogen sensor structure that can effectively detect hydrogen concentrations, with the hydrogen sensor's resistance inversely proportional to hydrogen gas concentration, allowing for accurate hydrogen sensing within integrated circuits.

Implementation Method 1

the hydrogen-free oxide layer is formed using in-situ steam generation, creating a hydrogen sensing interface with weak bonding and dangling bonds, allowing for efficient hydrogen detection

Methodology Applied
Scientific EffectAbsorption: Absorption (physical)

Implementation Method 2

the hydrogen-free oxide layer is formed using in-situ steam generation

Methodology Applied
Scientific EffectOxidation: Oxidation

Implementation Method 3

a protection layer to prevent moisture penetration

Methodology Applied
Scientific EffectPhysical barrier: Physical Containment

Data Source

PatentUS20240410854A1Semiconductor structure, integrated circuit and manufacturing method thereof
Publication Date: 2024.12.12 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20240410854A1 patent drawing
  • US20240410854A1 patent drawing
  • US20240410854A1 patent drawing

AI summary

A semiconductor structure is disclosed. The semiconductor structure includes a semiconductor substrate, a hydrogen sensing stacked layer disposed over the semiconductor substrate, and a protection layer disposed on the hydrogen sensing stacked layer. The hydrogen sensing stacked layer comprises a hydrogen-free oxide layer and a metal oxide layer disposed on the hydrogen-free oxide layer.