Hydrogen Storage Wafer with Nickel Deactivation Layer
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Solution Overview
Problem
Current hydrogen storage technologies face challenges in achieving high density storage and efficient release of hydrogen at low temperatures and pressures, often requiring expensive equipment and processes like powder metallurgy and glove-box technology.
Innovation Solution
A hydrogen storage assembly using wafers made of magnesium-based alloys with a nickel de-activation layer to inhibit surface oxide formation, supported by a housing with heating elements for thermal radiation or conduction, allowing hydrogen-rich carrier fluids to flow over the wafers for efficient charging and discharging at moderate temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If powder-based metal hydride materials are used for hydrogen storage, then hydrogen storage density is improved, but manufacturing complexity and cost increase due to required powder metallurgy and glove-box technology
Solution Approach 1:
The invention transitions from powder-based to wafer-based (bulk) metal hydride materials, changing the physical form parameter. This eliminates the need for powder metallurgy and glove-box technology while achieving comparable or superior hydrogen storage density in the wafer configuration
Solution Approach 2:
The invention replaces expensive, complex manufacturing processes (powder metallurgy, glove-box technology) with simpler, more economical wafer fabrication methods. The wafer-based approach uses standard metallurgical techniques that are less costly and less complex than powder processing requirements
2Quantity of substance
If metal hydride wafers are used for hydrogen storage, then storage density is improved, but surface oxide formation impedes hydrogen absorption and desorption
Solution Approach 1:
The invention creates a composite structure by coating metal hydride wafers with catalytic materials (such as nickel, palladium, or platinum). This composite approach combines the high storage density of metal hydrides with the surface catalytic activity needed to prevent oxide formation and enhance hydrogen absorption/desorption kinetics
Solution Approach 2:
The catalytic coating acts as an intermediary layer between the metal hydride substrate and the hydrogen environment. This intermediate layer prevents direct oxidation of the metal hydride surface while facilitating hydrogen absorption and desorption through catalytic activity
3Productivity
If heating elements are added to achieve operating temperature for hydrogen charging, then hydrogen absorption efficiency is improved, but device complexity and energy consumption increase
Solution Approach 1:
The invention develops metal hydride compositions and catalytic coatings that enable hydrogen absorption at lower temperatures than conventional systems. By changing the material parameters (composition, surface properties), the system achieves efficient hydrogen charging without requiring extensive heating, thus reducing energy consumption while maintaining productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high density hydrogen storage and release capabilities at relatively low temperatures and pressures without the need for expensive equipment, promoting efficient hydrogen absorption and desorption while preventing surface oxide poisoning.
Implementation Method 1
Each of the electrical heating elements can be received in a respective sleeve and positioned between the reaction surfaces of adjacent ones of the plate wafers to heat the plate wafers by thermal radiation
Implementation Method 2
The at least one heating element can be arranged to transfer heat to the at least one wafer to attain an operating temperature suitable for hydrogen charging on the reaction surface
Implementation Method 3
The hydrogen storage assembly can include a de-activation material on the reaction surface for inhibiting formation of surface oxide that impedes hydrogen absorption during charging and hydrogen desorption during discharging
Implementation Method 4
a substrate material that produces metal hydride when exposed to a hydrogen-rich carrier fluid
Implementation Method 5
Metal hydrides, such as MgH2, NaAlH4, LiAlH4, LiH, LaNi5H6, TiFeH2 and palladium hydride, with varying degrees of efficiency, can be used as a storage medium for hydrogen
Data Source
AI summary
A hydrogen storage assembly includes at least one wafer formed of a substrate material that produces metal hydride when exposed to a hydrogen-rich carrier fluid. The wafer can be supported by a housing and arranged so that the hydrogen-rich carrier fluid can flow over a reaction surface of the wafer. At least one heating element can be arranged to transfer heat to the wafer to attain an operating temperature suitable for hydrogen charging on the reaction surface. A de-activation material may be provided on the reaction surface for inhibiting formation of surface oxide that impedes hydrogen absorption during charging and hydrogen desorption during discharging. The at least one wafer can include a plurality of monolithic plate wafers spaced apart about a central axis of the assembly. The at least one wafer can include a plurality of monolithic disc wafers in at least one stacked arrangement.