Hydrophilic Annular Surface for Substrate Liquid Spreading
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in evenly coating hydrophobic substrates with processing liquids, leading to incomplete processing and potential contamination from mist or particles, while high flow rates increase costs and impact risks.
Innovation Solution
A substrate processing apparatus that uses a non-contact substrate holding unit and a hydrophilic surface placing unit to create an annular hydrophilic surface along the substrate's perimeter, allowing the processing liquid to spread evenly and reduce consumption, even on hydrophobic surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the processing liquid is discharged at a high flow rate to ensure complete coverage of hydrophobic substrate surfaces, then the coverage completeness is improved, but the processing liquid consumption increases
Solution Approach 1:
A hydrophilic annular member is introduced as an intermediary element between the processing liquid and the hydrophobic substrate. This member modifies the interaction interface by providing a hydrophilic surface that promotes liquid spreading, enabling complete coverage at reduced flow rates without direct contact between the processing liquid and the hydrophobic substrate surface
Solution Approach 2:
The invention applies local quality modification by placing a hydrophilic annular member only at the peripheral region of the substrate. This localized hydrophilic zone creates a gradient effect that guides the processing liquid from the center outward, ensuring complete peripheral coverage while maintaining lower overall liquid consumption
2Manufacturing precision
If the substrate is rotated at a high speed to prevent exposure of the upper surface, then the coverage completeness is improved, but the mist generation increases
Solution Approach 1:
The hydrophilic annular member serves as a mediator that enables complete liquid coverage at lower rotation speeds. By facilitating liquid spreading through its hydrophilic surface properties, it eliminates the need for high-speed rotation, thereby reducing mist generation while maintaining coverage completeness
3Manufacturing precision
If the processing liquid is supplied at a high flow rate to achieve even processing, then the processing uniformity is improved, but the impact on surrounding members increases
Solution Approach 1:
The hydrophilic annular member acts as an intermediary that distributes the processing liquid evenly across the substrate surface at reduced flow rates. This intermediary structure guides the liquid flow in a controlled manner, achieving uniform processing while minimizing the impact force on surrounding chamber members
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures complete coverage of the substrate surface with reduced processing liquid consumption, minimizing contamination risks and operational costs by maintaining a consistent liquid film without high flow rates or high-speed rotation.
Implementation Method 1
a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate
Implementation Method 2
allowing the processing liquid to spread evenly and reduce consumption, even on hydrophobic surfaces
Data Source
AI summary
A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.