IC Cell Gate Layout Across Boundaries to Eliminate Dummy Gates

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Solution Overview

Problem

Integrated circuit (IC) layout designs often require significant area due to the presence of dummy gate regions at cell boundaries, which can be inefficient in terms of space utilization.

Innovation Solution

The method involves generating IC layouts where a gate region intersects active regions within a cell and extends into adjacent cells, eliminating the need for dummy gate regions at cell boundaries by using boundary protrusions and recesses to align and connect gate regions across cell boundaries.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If dummy gate regions are used at cell boundaries to ensure proper transistor function, then reliability is improved, but area increases

Engineering Contradiction:

Improvetransistor functionVSAvoidlayout area

Core Design Contradiction:

ReliabilityVSArea of stationary object

Solution Approach 1:

The gate region is merged across cell boundaries, extending continuously from one cell into adjacent cells. This eliminates the need for separate dummy gate regions at boundaries, as the gate structure serves both cells simultaneously, reducing total area while maintaining transistor reliability

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The gate region performs multiple functions: it defines transistors within its own cell and simultaneously defines transistors in adjacent cells. This multi-functional gate structure replaces the need for dedicated dummy gates at cell boundaries, achieving space efficiency without sacrificing device function

Inventive Principle:

Principle #6Universality (Multi-functionality)

2Area of stationary object

If gate regions are extended across cell boundaries, then area efficiency is improved, but manufacturing precision requirements increase

Engineering Contradiction:

Improvelayout areaVSAvoidgate region alignment

Core Design Contradiction:

Area of stationary objectVSManufacturing precision

Solution Approach 1:

The layout is segmented into modular cells with standardized boundary protrusions and recesses. These geometric features provide precise alignment references that guide the extension of gate regions across cell boundaries, ensuring manufacturing precision through repeatable modular structures

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Boundary protrusions and recesses act as intermediary geometric features that mediate the connection between adjacent cells. These features serve as alignment guides and physical interfaces that facilitate precise gate region extension across cell boundaries during manufacturing

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS11776949B2Integrated circuit device and method

Publication Date: 2023.10.03 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

An IC device includes a first active area extending away from a first endpoint in a first direction, a second active area extending away from a second endpoint in the first direction, a third active area positioned between the first and second active areas, and a gate structure perpendicular to the first through third active areas. The gate structure overlies each of the first and second endpoints and the third active area, and the third active area extends away from the gate structure in a second direction opposite the first direction.