Integrated Circuit Color Remapping for Multi-Patterning
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Solution Overview
Problem
The existing methods for designing integrated circuits face challenges in efficiently managing color violations between multi-height and single height cells during the multi-patterning process, which can lead to suboptimal layout designs and increased development time.
Innovation Solution
A computer-implemented method is introduced that allocates colors to patterns of cells, generates shift cells for color remapping, and performs a color remapping operation to resolve color violations between multi-height and single height cells, utilizing a standard cell library to optimize cell placement and routing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multi-height cells and single height cells are placed in a cell layout without color remapping, then the layout can be generated quickly, but color violations occur between adjacent cells that need to be resolved manually
Solution Approach 1:
The system performs preliminary color remapping by generating shift cells for each cell type (single height and multi-height) before the actual layout placement. These pre-computed shift cells contain all possible color remapped versions of the cell patterns, allowing the placement algorithm to automatically select appropriate variants without manual intervention during layout generation.
Solution Approach 2:
The system creates copy variants of cell patterns by generating shift cells that replicate the original cell structures with different color assignments. For each cell type, multiple shift cell variants are generated where the patterns are copied but with remapped colors, enabling automatic resolution of color violations during placement.
2Manufacturing precision
If color remapping operation is performed manually to resolve color violations, then color conflicts can be addressed, but the development time increases significantly
Solution Approach 1:
The placement algorithm performs self-service by automatically detecting color violations between adjacent cells and autonomously selecting appropriate shift cell variants to resolve conflicts. The system monitors color assignments during placement and automatically remaps colors using pre-generated shift cells, eliminating the need for manual color conflict resolution.
Solution Approach 2:
The system implements feedback mechanisms where the placement algorithm continuously monitors color assignments between adjacent cells during the layout generation process. When color violations are detected, the algorithm uses feedback information to automatically select appropriate shift cell variants, creating an iterative optimization process that resolves conflicts in real-time.
3Ease of operation
If shift cells are generated for all cell types, then color violations can be automatically resolved during placement, but the standard cell library becomes more complex
Solution Approach 1:
The system segments the cell library into original cell types and their corresponding shift cell variants. Each cell type (single height or multi-height) is segmented into multiple color-variant versions, allowing the placement algorithm to selectively use appropriate variants without managing a single monolithic complex library structure.
Solution Approach 2:
The system adds a new dimension to the cell library organization by introducing shift cell variants as separate entities from the original cells. This dimensional separation allows original cells and their color-remapped variants to be stored and managed independently, simplifying the library structure while enabling automatic color remapping during placement.
Data Source
AI summary
A computer-implemented method of designing an integrated circuit (IC) includes allocating a plurality of colors to a plurality of patterns corresponding to one layer of a first cell so that a multi-patterning technology is designated for use in forming the plurality of patterns, the first cell being a multi-height cell corresponding to a plurality of rows, generating a plurality of shift cells, in which a color remapping operation associated with the plurality of patterns is performed for each row, with respect to the first cell, and storing a cell set including the first cell and the plurality of shift cells in a standard cell library.


