IC Pattern Defect Detection With Attention-Guided Image Context

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Solution Overview

Problem

Existing defect detection methods for objects with integrated circuit patterns, such as photolithography masks and wafers, face challenges in accuracy and efficiency due to limitations in considering global image context and the fixed weights of convolutional neural networks.

Innovation Solution

A computer-implemented method using a machine learning model with an attention mechanism for defect detection in imaging datasets of objects with integrated circuit patterns, which enhances defect highlighting and improves accuracy by considering the structural context of circuit patterns.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If convolutional neural networks with fixed weights are used for defect detection, then the detection process is computationally efficient, but the accuracy is limited due to inability to consider global image context

Engineering Contradiction:
Improvedefect detection accuracyVSAvoidmodel complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent segments the defect detection task into two distinct stages: a coarse detection stage using a lightweight CNN for initial defect localization, and a fine detection stage using a Transformer model with attention mechanisms for precise defect characterization. This segmentation allows the system to benefit from both the computational efficiency of CNNs and the global context understanding of Transformers, resolving the contradiction between accuracy and complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces dynamic adaptability by making the second stage model configurable based on the detection needs. The system can dynamically adjust whether to apply the computationally intensive Transformer model only to regions containing detected defects or to the entire image, thereby balancing accuracy requirements with computational resources and model complexity.

Inventive Principle:
Principle #15Dynamics

2Reliability

If traditional defect detection methods are used, then the computation time is reduced, but the accuracy and reliability of defect detection deteriorates

Engineering Contradiction:
Improvedefect detection reliabilityVSAvoidcomputation time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent applies preliminary action by using the first stage CNN model to pre-process the image and identify potential defect regions before applying the more reliable but computationally intensive Transformer model. This preliminary filtering ensures that the high-accuracy model only processes relevant regions, maintaining reliability while significantly reducing overall computation time compared to applying the Transformer model to the entire image.

Inventive Principle:
Principle #10Preliminary action

3Adaptability or versatility

If advanced machine learning models with attention mechanism are applied, then the adaptability to different applications and imaging datasets is improved, but the memory requirements and user effort increase

Engineering Contradiction:
Improveadaptability to different applicationsVSAvoidmemory requirements
Core Design Contradiction:
Adaptability or versatilityVSQuantity of substance

Solution Approach 1:

The patent implements dynamic resource allocation where the system adaptively determines whether to apply the full two-stage process or simplified versions based on dataset characteristics and computational constraints. This allows high adaptability across different applications while dynamically adjusting memory consumption and user effort requirements to match the specific task demands.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS20250155378A1Computer implemented method for defect detection in an imaging dataset of an object comprising integrated circuit patterns using machine learning models with attention mechanism
Publication Date: 2025.05.15 CARL ZEISS SMT GMBH
  • US20250155378A1 patent drawing
  • US20250155378A1 patent drawing
  • US20250155378A1 patent drawing

AI summary

The invention relates to a computer implemented method for defect detection comprising: obtaining an imaging dataset and a reference dataset of an object comprising integrated circuit patterns; and detecting defects in the imaging dataset using the imaging dataset and the reference dataset, wherein a machine learning model for defect highlighting is applied to the imaging dataset as input and generates a highlighted defect dataset as output, and wherein the machine learning model for defect highlighting comprises at least one attention mechanism. The invention also relates to computer programs, computer-readable media and corresponding systems.