IC Design Curvature and Spacing Violation Checking
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Solution Overview
Problem
Current IC design tools are inadequate for checking minimum width, minimum distance, and maximum curvature of curved boundaries defined by arbitrary parametric curves, leading to false violations or missed violations, especially in complex shapes like silicon photonics and microfluidics devices.
Innovation Solution
A computer-implemented method that determines minimum width and minimum distance by creating offset boundary curves, finding intersections, and assigning nodes to intersection points, while also checking maximum positive and minimum negative curvature, using exact representation by mathematical curves in symbolic form.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If arbitrary parametric curves are used to define boundary shapes, then the accuracy of curvature representation is improved, but the complexity of checking minimum width and minimum distance increases
Solution Approach 1:
The patent transforms the geometric checking problem into a parameter-based mathematical problem by representing curves with parametric equations and using offset distance parameters to define minimum width and distance constraints. This allows systematic analysis of curve properties through parameter manipulation rather than complex geometric computations.
Solution Approach 2:
The patent replaces traditional geometric and mechanical checking methods with mathematical analysis using calculus and algebra. Instead of using computational geometry algorithms or physical approximation methods, the invention uses analytical solutions involving derivatives, integrals, and algebraic equations to determine curvature and spacing violations.
2Device complexity
If polygon approximation is used for curved boundaries, then the checking process is simplified, but false violations or missed violations occur
Solution Approach 1:
The patent creates offset curves as mathematical copies of the original boundary curves, shifted by a specified distance. These offset curves accurately represent the minimum width and distance constraints without requiring polygonal approximation, preserving the exact geometric properties of the original curves while enabling systematic violation detection.
Solution Approach 2:
Instead of approximating curved boundaries with polygons and checking for violations, the patent inverts the approach by creating offset curves from the original boundaries and checking for intersections. This reverse methodology ensures that the original curve geometry is preserved while systematically identifying violations through mathematical intersection analysis.
3Measurement precision
If exact mathematical curve representation is used, then the precision of minimum width and distance checking is improved, but the computational complexity increases
Solution Approach 1:
The patent divides the curve checking process into distinct segments: creating offset curves, finding intersection points, analyzing curve sections between intersections, and determining violations. This segmentation allows the complex problem to be solved through a series of simpler, manageable computational steps rather than a single complex algorithm.
Solution Approach 2:
The patent performs preliminary actions by first creating offset curves from the original boundaries before conducting the actual minimum width and distance checking. This preparatory step transforms the checking problem into an intersection detection problem, which is computationally more efficient and can be solved using well-established algebraic methods.
Data Source
AI summary
A method for determining a minimum width, a minimum distance and maximum curvature violations for an integrated circuit (IC) design is provided. The method includes creating a set of offset boundary curves based on inputs received for a given boundary set and a defined minimum width and a defined minimum distance. The method also includes determining all intersections between all pairs of offset boundary curves and assigning a node to each intersection point. The method also includes determining all sections between intersection points for each offset curve and determining successors of the sections. The method also includes determining all violation boundaries formed by the sections and forming a layout to manufacture a mask for fabricating the IC when no violations occur. A system and computer-readable media for performing the method are also provided.