Integrated Circuit Design Pattern Correction via Defect Normalization
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Solution Overview
Problem
Current Design for Manufacturability (DFM) processes face challenges in automating the correction of design patterns for integrated circuits, as they struggle to simultaneously minimize independent defects such as random, systematic, and parametric defects, leading to inconsistencies and increased manual modification time due to the lack of common criteria for process and design engineers.
Innovation Solution
A method and apparatus for automatically correcting the layout of design patterns by generating defect characteristic functions for each type of defect, determining a normalization factor to correlate these functions, and creating a general defect characteristic function to minimize overall defects, using tools like CAA, CFA, and LFD devices to analyze and modify the design pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manual modification of design pattern layout is performed to minimize process defects, then manufacturing precision is improved, but productivity deteriorates due to increased modification time
Solution Approach 1:
The patent replaces manual mechanical modification processes with an automated computer-based system. The automated design pattern correction apparatus uses algorithms to analyze process defects and automatically modify design patterns, eliminating the need for manual layout adjustments while maintaining high precision in defect minimization.
Solution Approach 2:
The system enables self-service correction by automatically analyzing process defect data and generating corrected design patterns without human intervention. The apparatus uses built-in algorithms to identify defects, determine correction strategies, and modify layouts autonomously, allowing the design process to self-correct based on observed process variations.
2Reliability
If multiple independent defect types are minimized simultaneously, then reliability is improved, but device complexity increases due to lack of common criteria
Solution Approach 1:
The patent creates a universal correction framework that handles multiple independent defect types (random defects, systematic defects, parametric defects) through a single integrated system. The apparatus uses common normalization factors and unified algorithms that work across all defect types, providing multi-functional capability without increasing operational complexity for users.
Solution Approach 2:
The system changes parameters by introducing normalization factors that standardize different defect types into a common metric. By transforming diverse defect characteristics into normalized values, the system can simultaneously optimize multiple defect types using unified correction algorithms, reducing the complexity of managing separate correction criteria for each defect type.
3Adaptability or versatility
If process and design engineers use different correction criteria, then adaptability is maintained for specific expertise, but ease of operation deteriorates due to inconsistency
Solution Approach 1:
The patent creates equipotentiality by establishing a common reference framework that equalizes the correction criteria used by process engineers and design engineers. The system uses shared normalization factors and unified algorithms that provide a level playing field, allowing both engineering disciplines to work with the same standards while still applying their specialized knowledge within that common framework.
Data Source
AI summary
In an apparatus and method for automatically correcting a design pattern in view of different process defects, defect characteristic functions that indicate frequencies of each process defect independent from one another are generated, and a normalization factor that indicates relationships between the defect characteristic functions is determined. A general defect characteristic function indicating a frequency of general defects is generated using the defect characteristic functions and the normalization factor. The general defect causes the same process failure as caused by each of the process defects. The design pattern is modified using the general defect characteristic function in such a manner that the frequency of the general defects is minimized when at least one portion of the design pattern corresponding to the model pattern is transcribed on the substrate. Accordingly, the whole design pattern may be automatically corrected based on the general defect characteristic function.