Semiconductor IC-Embedded Substrate Heat Dissipation Structure
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Solution Overview
Problem
Existing semiconductor IC-embedded substrates face complexity and increased manufacturing processes due to the need for both via conductors on the main and back surfaces, which complicates heat dissipation.
Innovation Solution
A semiconductor IC-embedded substrate design featuring insulating and conductor layers with a rewiring pattern connected to power supply pads, allowing heat dissipation through the main surface without thermal vias on the back surface, using a simpler structure with overlapping openings and wiring patterns for efficient heat transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If both via conductors on the main surface and back surface are formed to dissipate heat, then heat dissipation property is improved, but device complexity and manufacturing process increase
Solution Approach 1:
The invention extracts the heat dissipation function from the back surface thermal via approach and relocates it to the main surface. By forming through-holes that penetrate the semiconductor IC from the main surface to the back surface, and filling these through-holes with conductive material, the patent creates a simplified thermal conduction path that eliminates the need for separate back surface thermal vias while maintaining effective heat dissipation.
Solution Approach 2:
The through-holes formed in the semiconductor IC serve multiple functions: they provide electrical connection between pad electrodes on the main surface and corresponding electrodes on the back surface, and simultaneously serve as thermal conduction paths for heat dissipation. This multi-functional design eliminates the need for separate structures for electrical connection and thermal management, reducing overall device complexity.
2Temperature
If both via conductors on the main surface and back surface are formed to dissipate heat, then heat dissipation property is improved, but manufacturing process complexity increases
Solution Approach 1:
The invention merges the electrical connection function and thermal conduction function into a single through-hole structure. By forming one set of through-holes that serve both purposes, the patent eliminates the need for separate manufacturing processes for main surface vias, back surface vias, and thermal vias, thereby simplifying the overall manufacturing process while achieving effective heat dissipation.
3Temperature
If thermal vias are formed on the back surface, then heat dissipation is achieved, but device structure becomes more complex
Solution Approach 1:
Instead of forming thermal vias on the back surface as in conventional designs, the invention inverts the approach by forming through-holes from the main surface through the semiconductor IC to the back surface. This inverted structure allows the through-holes to serve as both electrical connection paths and thermal conduction paths, eliminating the need for separate back surface thermal vias and reducing structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration achieves high heat dissipation efficiency with a simpler structure and reduced manufacturing complexity, ensuring effective heat transfer from the semiconductor IC without the need for back-surface thermal vias.
Implementation Method 1
heat generated by the semiconductor IC is efficiently dissipated from the main surface side of the semiconductor IC through the plurality of power supply pads, rewiring pattern, first wiring pattern and second wiring pattern
Data Source
AI summary
Disclosed herein is a semiconductor IC-embedded substrate that includes insulating layers, conductor layers, and a semiconductor IC embedded in the insulating layers. The insulating layers includes first and second insulating layers. The conductor layers includes a first conductor layer having a first wiring pattern and a second conductor layer having a second wiring pattern. The semiconductor IC includes a rewiring pattern connected in common to power supply pads. The rewiring pattern is connected to the first wiring pattern via a first opening of the first insulating layer. The first wiring pattern is connected to the second wiring pattern via second openings of the second insulating layer. The first opening is greater in area than each of the second openings.


