Integrated Circuit Inspection Care Area Generation

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Solution Overview

Problem

Conventional high-throughput optical inspection systems lack the resolution to detect defects in integrated circuits, while high-resolution electron beam systems have low throughput, making them unsuitable for inline production due to extensive stage movement operations that reduce efficiency and accuracy.

Innovation Solution

Generating care areas that include potential defects and organizing them based on spatial relationships to minimize stage movements, optimizing the inspection path, and creating a recipe file for sequential inspection using a high-resolution inspection system.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If high-resolution electron beam systems are used for inspection, then measurement precision is improved, but productivity deteriorates due to extensive stage movement operations

Engineering Contradiction:
Improvedefect detection resolutionVSAvoidinspection throughput
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The inspection area is segmented into discrete care areas based on defect location data. Each care area represents a specific region containing potential defects that requires high-resolution inspection. This segmentation allows the system to focus only on relevant areas rather than scanning the entire wafer surface, thereby improving productivity while maintaining measurement precision for critical regions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Care areas are pre-identified and organized into an optimized inspection sequence before the actual inspection process. The system uses defect location data to determine which areas require high-resolution inspection and arranges them in an optimal path that minimizes stage movements. This preliminary planning reduces the number of stage movements required during inspection, addressing the productivity issue while preserving measurement precision.

Inventive Principle:
Principle #10Preliminary action

2Area of stationary object

If extensive stage movement operations are performed, then coverage area is improved, but reliability deteriorates due to reduced inspection accuracy

Engineering Contradiction:
Improveinspection coverage areaVSAvoidinspection accuracy
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The large inspection area is divided into multiple discrete care areas that are inspected sequentially. By segmenting the coverage area into manageable units with optimized traversal paths, the system minimizes the number of stage movements required to cover the entire area. This reduces the accumulation of positioning errors and maintains inspection accuracy while achieving comprehensive coverage.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The inspection system follows a continuous optimized path through all care areas, minimizing idle movements and maintaining steady inspection operations. The sequential organization of care areas ensures that the stage moves efficiently from one inspection point to the next without unnecessary deviations, preserving inspection accuracy while achieving complete area coverage.

Inventive Principle:
Principle #20Continuity of useful action

3Productivity

If conventional optical inspection systems are used, then productivity is improved, but measurement precision deteriorates due to insufficient resolution

Engineering Contradiction:
Improveinspection throughputVSAvoiddefect detection resolution
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The system applies different inspection qualities to different areas of the wafer. High-resolution electron beam inspection is applied locally to identified care areas where defects are suspected, while other areas may use faster optical methods or skip inspection. This local application of high precision inspection maintains overall productivity while ensuring measurement precision is improved for critical defect detection zones.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS10515444B2Care area generation for inspecting integrated circuits
Publication Date: 2019.12.24 DONGFANG JINGYUAN ELECTRON LTD
  • US10515444B2 patent drawing
  • US10515444B2 patent drawing
  • US10515444B2 patent drawing

AI summary

Methods and systems for inspecting integrated circuits are provided. The method includes generating care areas that each includes at least one potential defect, organizing the generated care areas based on a first set of spatial relationships to provide a list of neighboring care areas, wherein each neighboring care area is an entry within the list, and generating a recipe file of the list, wherein each neighboring care area is inspected sequentially using a high-resolution inspection system. The system comprises a memory including instructions executable by a processor to: generate care areas that each includes at least one potential defect, organize the generated care areas based on a first set of spatial relationships to provide a list of neighboring care areas that are each an entry within the list, and generate a recipe file of the list, wherein each neighboring care area is inspected sequentially using a high-resolution inspection system.