IC Layout DRC for Mixed Manhattan and Non-Manhattan Features
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Solution Overview
Problem
Conventional design rule checking (DRC) methods fail to efficiently handle layouts with a combination of Manhattan and non-Manhattan features, leading to false errors and inefficiencies in integrated circuit (IC) fabrication.
Innovation Solution
A computer-implemented method that separates Manhattan and non-Manhattan features in an IC layout, applying distinct design rule sets tailored to each category to ensure precise compliance with fabrication constraints.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional DRC methods are used on layouts with mixed Manhattan and non-Manhattan features, then the DRC process can be performed using standard design rules, but false errors are generated and manufacturing precision deteriorates
Solution Approach 1:
The patent segments the layout into distinct Manhattan features and non-Manhattan features, applying separate design rule sets to each category. This segmentation prevents false errors by ensuring that non-Manhattan features are evaluated against appropriate design rules rather than Manhattan-specific rules, thereby maintaining both processing efficiency and DRC accuracy.
Solution Approach 2:
The patent applies local quality by using direction-specific design rules tailored to each feature type. Manhattan features are checked against Manhattan-oriented design rules, while non-Manhattan features are checked against non-Manhattan design rules. This localized approach ensures that each feature type is evaluated with the appropriate criteria, eliminating false errors while maintaining efficient processing.
2Ease of manufacture
If Manhattan-specific design rules are applied to non-Manhattan features, then the DRC can be performed using existing rule sets, but false errors are generated reducing reliability
Solution Approach 1:
The patent segments the feature set into Manhattan and non-Manhattan categories, allowing each to be processed with its own appropriate design rules. This maintains reliability by preventing misapplication of Manhattan rules to non-Manhattan features, while keeping implementation simple through automated feature classification and rule selection.
Solution Approach 2:
The patent changes the parameter of design rule selection based on feature type. Instead of using a single uniform set of design rules, the system dynamically selects appropriate design rules based on whether features are Manhattan or non-Manhattan type, thereby ensuring reliable DRC results without complicating the implementation process.
3Manufacturing precision
If manual checking of false errors is performed, then DRC accuracy can be improved, but the complexity and time required increases significantly
Solution Approach 1:
The patent eliminates the need for manual checking by segmenting features into Manhattan and non-Manhattan categories and automatically applying the appropriate design rules to each. This automated segmentation approach maintains high DRC accuracy while avoiding the complexity and time requirements of manual verification of false errors.
Solution Approach 2:
The patent implements self-service by enabling the DRC system to automatically classify features and select appropriate design rules without human intervention. The system serves itself by identifying false errors through proper feature categorization and rule application, thereby improving accuracy without increasing process complexity or requiring manual checking.
Data Source
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AI summary
In an aspect there is provided a computer-implemented method for DRC of a layout of an integrated circuit design, the layout comprising a combination of Manhattan features and non-Manhattan features, the method comprising: obtaining the layout; processing the layout to identify Manhattan features and non-Manhattan features in the layout; obtaining a first rule set of one or more design rules exclusively pertaining to Manhattan features; performing a first DRC by applying the first rule set exclusively to the identified Manhattan features in the layout; obtaining a second rule set of one or more design rules pertaining to at least non-Manhattan features; and performing a second DRC by applying the second rule set to at least the identified non-Manhattan features in the layout.