IC Layout DRC Using Separate Rules for Mixed Feature Types
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Solution Overview
Problem
Conventional design rule checking (DRC) methods fail to efficiently handle layouts with a combination of Manhattan and non-Manhattan features, leading to false errors and inefficiencies in integrated circuit (IC) fabrication.
Innovation Solution
A computer-implemented method that separates Manhattan and non-Manhattan features in an IC layout, applying distinct design rule sets tailored to each type to ensure precise compliance with fabrication constraints.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional DRC methods are used on layouts with mixed Manhattan and non-Manhattan features, then the DRC process can be performed using standard rules, but false errors are generated and manufacturing precision deteriorates
Solution Approach 1:
The layout is segmented into two distinct groups: Manhattan features and non-Manhattan features. This segmentation allows each group to be processed with its own specialized rule set, preventing false errors while maintaining processing efficiency. The method divides the feature identification and rule application processes into separate stages for each feature type.
Solution Approach 2:
Different quality standards and rule sets are applied locally to different feature types. Manhattan features are evaluated against Manhattan-specific design rules, while non-Manhattan features are evaluated against non-Manhattan-specific design rules. This local differentiation ensures each feature type is assessed with the appropriate criteria, eliminating false errors.
2Device complexity
If Manhattan-specific design rules are applied to non-Manhattan features, then the DRC process is simplified, but false errors are generated reducing reliability
Solution Approach 1:
The DRC process is segmented into two independent sub-processes: one for Manhattan features and one for non-Manhattan features. Each sub-process uses rules appropriate to its feature type, preventing the generation of false errors while keeping each individual process relatively simple.
Solution Approach 2:
The method changes the parameter of rule selection based on feature type. Instead of using a single universal rule set, the system dynamically selects appropriate rule sets based on whether features are Manhattan or non-Manhattan type, ensuring rule compatibility and eliminating false errors.
3Manufacturing precision
If manual checking of false errors is performed, then DRC accuracy can be improved, but productivity decreases due to the large number of circuit features
Solution Approach 1:
The method performs preliminary classification of features into Manhattan and non-Manhattan categories before the DRC process. This preliminary action prevents false errors from being generated in the first place, eliminating the need for manual verification and maintaining both high accuracy and productivity.
Solution Approach 2:
The DRC system performs self-verification by automatically identifying feature types and applying appropriate rules. This self-service capability eliminates the need for manual checking of false errors, maintaining productivity while ensuring accuracy through automated feature-type-specific rule application.
Data Source
AI summary
In an aspect there is provided a method computer-implemented method for DRC of a layout of an integrated circuit design, the layout comprising a combination of Manhattan features and non-Manhattan features, the method comprising: obtaining the layout; processing the layout to identify Manhattan features and non-Manhattan features in the layout; obtaining a first rule set of one or more design rules exclusively pertaining to Manhattan features; performing a first DRC by applying the first rule set exclusively to the identified Manhattan features in the layout; obtaining a second rule set of one or more design rules pertaining to at least non-Manhattan features; and performing a second DRC by applying the second rule set to at least the identified non-Manhattan features in the layout.