IC Layout Migration Using Reusable Code and Design Rules
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing layout migration tools struggle to efficiently convert semiconductor layouts across multiple semiconductor processes with different design rules, often requiring extensive manual adjustments and expertise, and are limited to specific target design rules, making it difficult to achieve one-to-many layout migration without the use of parameterized cells or constraints.
Innovation Solution
A reusable layout database integrated with layout engineer expertise, using a CAD toolkit that allows for the specification of reusable code to modify and migrate layouts across various design rules, enabling automatic conversion of layouts to multiple target processes by parsing and modifying GDSII files, and incorporating placement and routing functions to ensure compliance with diverse design rules.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If automated layout migration software is used to convert layouts to newer processes, then productivity is improved, but manufacturing precision deteriorates due to design rule violations
Solution Approach 1:
The system performs iterative design rule checking during the layout migration process. After each transformation operation, the migrated layout is automatically checked against the target process design rules, and violations are fed back to guide further adjustments, ensuring both efficiency and compliance
Solution Approach 2:
The system transforms layout geometry parameters non-uniformly based on the specific design rules of the target process. Instead of applying a fixed scaling factor, it adjusts different geometric parameters (line widths, spacings, angles) independently to satisfy the varying design rule requirements of the target process
2Manufacturing precision
If layout engineers manually adjust layouts for each target process, then manufacturing precision is improved through expert knowledge, but productivity deteriorates due to extensive manual effort
Solution Approach 1:
The system enables layout migration to automatically adapt to different target processes by self-configuring transformation parameters based on the specified design rules. The engineer only needs to provide the target process identifier, and the system handles the complex adaptation automatically
Solution Approach 2:
The system provides a universal layout migration framework that can handle multiple target processes and different design rule sets through a single tool interface, eliminating the need for separate specialized tools for each process node
3Length of moving object
If a layout is uniformly scaled to a smaller size for a newer process, then productivity is improved by reducing cell size, but manufacturing precision deteriorates due to design rule violations
Solution Approach 1:
The system applies different transformation operations to different regions and elements of the layout based on their specific characteristics and the target process requirements. Critical dimensions are adjusted with higher precision while less critical areas use coarser transformations
4Adaptability or versatility
If parameterized cells are used to enable migration to multiple processes, then adaptability is improved, but device complexity increases due to P-cell requirements
Solution Approach 1:
The system uses dynamic transformation parameters that are determined at migration time based on the target process specification. The layout structure remains static and simple, but the transformation applied to it is dynamic and adaptable to different process nodes
Data Source
AI summary
An existing layout of an Integrated Circuit (IC) is migrated to two or more target layouts for different semiconductor processes with different design rules. The existing layout file is parsed for data items such as boundaries, paths, text, and cell instances to generate a layout database file with a text format. A layout engineer selects functions from a layout design toolkit and writes reusable code with these functions. Placement functions can specify relative locations to other data items that are dependent on the design rules. Routing functions allow interconnect to be re-routed after placements are adjusted for various target design rules. An analog layout expertise integrator replaces some of the data items in the layout database file with the reusable code to generate a reusable layout database. A layout generator compiles the reusable layout database and converts it to multiple target layouts for multiple design rules.