IC Transistor Layout to Mitigate N-P Boundary Effect

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Solution Overview

Problem

The performance of integrated circuit (IC) devices is negatively impacted by local layout effects, particularly the N-P boundary effect, which causes increased threshold voltage in transistors due to the proximity of N-type and P-type transistors, leading to weakened transistor performance and potential breakdown of Vmin targets.

Innovation Solution

The implementation of a unipolar layout within IC devices, where N-type transistors are arranged without P-type transistors, mitigates the N-P boundary effect by converting bipolar layouts to unipolar configurations, reducing vacancy diffusion and minimizing threshold voltage increases.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If bipolar layout is used to interconnect N-type and P-type transistors, then device functionality is achieved, but N-P boundary effect increases threshold voltage and degrades transistor performance

Engineering Contradiction:
Improvetransistor performanceVSAvoidN-P boundary effect
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent extracts and removes P-type transistors from the local vicinity of N-type transistors in the first metal layer, creating unipolar regions that eliminate the N-P boundary effect. This extraction of the harmful element (P-type transistors) from close proximity to N-type transistors directly resolves the threshold voltage degradation issue while maintaining overall device functionality through alternative routing in higher metal layers.

Inventive Principle:
Principle #2Taking out (Extraction)

2Area of stationary object

If N-type and P-type transistors are placed in proximity for compact design, then area efficiency is improved, but threshold voltage increases due to vacancy diffusion

Engineering Contradiction:
Improvelayout compactnessVSAvoidthreshold voltage control
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent resolves the area efficiency versus threshold voltage control contradiction by transitioning to higher dimensions. Unipolar layouts are implemented in the first metal layer to maintain compactness, while interconnections between different transistor types are routed through higher metal layers (second metal layer and above), effectively separating N-type and P-type transistors in the vertical dimension while preserving horizontal compactness.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Reliability

If unipolar layout is implemented to reduce N-P boundary effect, then threshold voltage is reduced and transistor performance is improved, but layout complexity increases

Engineering Contradiction:
Improveelectrical characteristicsVSAvoidlayout configuration
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies local quality by implementing unipolar layouts selectively in specific regions where N-type transistors are concentrated, rather than uniformly across the entire device. This localized approach reduces N-P boundary effects in critical areas while maintaining overall layout simplicity and avoiding unnecessary complexity in regions where bipolar configurations are acceptable.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in lower threshold voltages and improved performance of IC devices by minimizing the N-P boundary effect, enhancing the electrical characteristics and reliability of transistors.

Implementation Method 1

reducing vacancy diffusion and minimizing threshold voltage increases

Methodology Applied
Scientific EffectVacancy diffusion: Diffusion

Data Source

PatentUS20240321887A1Integrated circuit device with reduced n-p boundary effect
Publication Date: 2024.09.26 INTEL CORP
  • US20240321887A1 patent drawing
  • US20240321887A1 patent drawing
  • US20240321887A1 patent drawing

AI summary

An IC device may have layout with reduced N-P boundary effect. The IC device may include two rows of transistors. The first row may include one or more P-type transistors. The second row may include N-type transistors. The gate electrode of a P-type transistor may include different conductive materials from the gate electrode of a N-type transistor. Each P-type transistor in the first row may be over a N-type transistor in the second row and contact the N-type transistor in the second row. For instance, the gate of the P-type transistor may contact the gate of the N-type transistor. Vacancy diffusion may occur at the boundary of the P-type transistor and the N-type transistor, causing N-P boundary effect. At least one or more other N-type transistors in the second row do not contact any P-type transistor, which can mitigate the N-P boundary effect in the IC device.