Integrated Circuit Layout Pattern Merging for Design Rule Compliance
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Solution Overview
Problem
As semiconductor manufacturing processes advance, designing integrated circuits (ICs) with increasingly smaller transistors becomes challenging, requiring improved design for manufacturing (DFM) techniques to optimize semiconductor device integration and manufacturing efficiency.
Innovation Solution
A computer-implemented method for designing IC layouts that involves receiving input layout data, performing design rule checks, merging patterns connected to the same net, and updating coloring information to match merged patterns with corresponding masks, facilitating multi-mask patterning and improving integration density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If transistor size is decreased to increase integration, then more transistors can be integrated on a semiconductor device, but manufacturing process becomes more challenging
Solution Approach 1:
The patent performs design rule checks and pattern merging operations during the layout design phase before manufacturing. By identifying and resolving design rule violations early in the design process, the patent prepares the layout in advance to be manufacturing-friendly, thus reducing manufacturing difficulty while maintaining high transistor density
Solution Approach 2:
The patent dynamically adjusts layout parameters such as pattern placement, merging, and coloring assignments based on design rule requirements. By optimizing these parameters during the design phase, the patent creates a layout that maintains high integration density while satisfying manufacturing constraints
2Quantity of substance
If more patterns are integrated in one layer to increase density, then integration density improves, but design rule violations increase
Solution Approach 1:
The patent implements an iterative process where design rule checks provide feedback on layout violations. Based on this feedback, the system automatically merges patterns or adjusts placements to resolve violations, ensuring design rule compliance while maintaining high integration density through continuous optimization
Solution Approach 2:
The patent merges multiple patterns into single patterns when they are connected to the same net and violate design rules. This merging operation reduces the number of separate patterns, resolves design rule violations, and maintains electrical functionality while improving layout compliance
3Manufacturing precision
If manual layout design is used to ensure precision, then design accuracy improves, but design time increases
Solution Approach 1:
The patent implements an automated layout optimization system that performs design rule checks, pattern merging, and coloring assignments automatically without requiring manual intervention. The system self-corrects design rule violations and optimizes layouts independently, maintaining high precision while significantly reducing design time compared to manual methods
Data Source
AI summary
A method of designing a layout of an integrated circuit (IC), which is implemented by a computer system or a processor, includes receiving input layout data, and performing a design rule check with regard to a plurality of patterns. The method includes, merging, from among a first pattern and a second pattern against the design rule, the first pattern with a third pattern connected to a same net as the first pattern, and generating output layout data.