IC Layout Scoring and Rearrangement for Void Area Reduction

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Solution Overview

Problem

As semiconductor manufacturing processes advance, the challenge of efficiently utilizing the increasingly smaller chip area in integrated circuits (ICs) has grown, necessitating a method to optimize layout design to enhance integration and reduce manufacturing complexity.

Innovation Solution

A method for designing an integrated circuit (IC) layout involves scoring the layout by calculating the area occupied by devices, the manufacturing process area, and void spaces, allowing for rearrangement to determine if devices should be rearranged based on a comparison with a threshold score, thereby optimizing the layout for improved efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If chip size is decreased to increase integration, then number of elements per IC increases, but manufacturing difficulty and complexity increase

Engineering Contradiction:
Improvenumber of elementsVSAvoidmanufacturing complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent implements a feedback mechanism through automated layout scoring and evaluation. The system calculates scores based on area utilization, void spaces, and design rules, then uses this feedback to automatically rearrange device layouts. This closed-loop feedback enables continuous optimization of chip layouts to maximize element density while maintaining manufacturability, directly addressing the contradiction between increasing element quantity and maintaining manufacturing simplicity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent changes key layout parameters including device positions, rotation angles, and spacing distances to optimize the balance between element density and manufacturability. By systematically varying these parameters and evaluating them against defined score criteria, the system achieves high integration without excessive manufacturing complexity.

Inventive Principle:
Principle #35Parameter changes

2Area of stationary object

If chip size is decreased to increase integration, then area utilization must improve, but layout design difficulty increases

Engineering Contradiction:
Improvechip areaVSAvoidlayout design difficulty
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent implements self-service through automated layout optimization. The system automatically calculates layout scores, identifies areas for improvement, and performs rearrangements without requiring manual designer intervention. This automation handles the complexity of optimizing chip area utilization, allowing designers to focus on higher-level architectural decisions rather than tedious layout adjustments.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent replaces manual mechanical layout adjustment with automated computational algorithms. Instead of designers manually moving and resizing devices to optimize space, the system uses computer-based scoring and optimization algorithms to automatically generate optimal layouts, substituting human manual operations with automated intelligent systems.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Loss of energy

If void area is reduced to improve area utilization, then layout score increases, but manufacturing process area requirements must be satisfied

Engineering Contradiction:
Improvewasted spaceVSAvoiddesign rule compliance
Core Design Contradiction:
Loss of energyVSManufacturing precision

Solution Approach 1:

The patent carefully adjusts critical layout parameters such as minimum spacing distances, device orientations, and placement positions to achieve optimal area utilization while maintaining compliance with design rules. The scoring system evaluates these parameter changes to ensure that reducing void areas does not compromise manufacturing precision or rule compliance.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses feedback through comprehensive score evaluation that includes both area utilization metrics and design rule compliance checks. The system continuously monitors whether layout modifications improve area efficiency while maintaining manufacturing precision, and uses this feedback to guide further optimizations, ensuring both goals are achieved simultaneously.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS20240169138A1Method of designing semiconductor device integrated circuit and layout thereof
Publication Date: 2024.05.23 SAMSUNG ELECTRONICS CO LTD
  • US20240169138A1 patent drawing
  • US20240169138A1 patent drawing
  • US20240169138A1 patent drawing

AI summary

A method of designing a layout of a semiconductor device includes receiving an input layout of the device, scoring the input layout, determining whether to rearrange at least one device of the semiconductor device based on the scoring, and generating an output layout based on a rearrangement. The scoring includes calculating a first area occupied by one or more devices included in the semiconductor device in the input layout, calculating a second area of a manufacturing process based on a design rule for the one or more devices and the first area, calculating a void area of the input layout based on the first area and the second area, and calculating a score of the input layout based on the void area.