IC Layout Design with Variable Boundary Spaces for Color Conflict Reduction
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Solution Overview
Problem
The design of semiconductor integrated circuits (ICs) faces challenges in reducing time and cost due to complexities in generating and implementing cell libraries, particularly in ensuring optimal spacing and coloring of patterns to avoid color conflicts and improve spatial efficiency.
Innovation Solution
A method for designing an IC layout involves placing cells with specific patterns of different colors and varying boundary spaces, using multi-patterning operations with different masks, and applying color inverting operations to satisfy space conditions, thereby optimizing the layout and reducing conflicts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If cells are placed adjacent to each other with patterns of different colors, then spatial efficiency is improved, but color conflicts may occur between adjacent patterns
Solution Approach 1:
The patent applies local quality by differentiating boundary space requirements based on pattern color relationships. Specifically, when two adjacent patterns have different colors, a first (smaller) boundary space is sufficient, while patterns of the same color require a second (larger) boundary space. This localized differentiation of spacing rules based on color properties enables tighter packing without color conflicts.
Solution Approach 2:
The patent changes the boundary space parameter dynamically based on the color relationship between adjacent patterns. By setting boundary space to a first value when colors differ and a second value when colors are the same, the system optimizes spatial efficiency while preventing color conflicts through parameter adaptation.
2Loss of time
If standard cell libraries are generated and implemented, then design time and cost are reduced, but complexities remain in ensuring optimal spacing and coloring
Solution Approach 1:
The patent implements self-service by enabling the placement tool to automatically determine appropriate boundary spaces based on pattern colors without requiring manual intervention. The system retrieves color information from standard cell library data, compares adjacent pattern colors, and automatically applies the correct boundary space rule, thereby reducing both design time and operational complexity.
Solution Approach 2:
The patent employs feedback mechanisms where the placement tool continuously checks color relationships between adjacent patterns and adjusts boundary spaces accordingly. By monitoring color conflicts and automatically correcting spacing based on color comparison feedback, the system maintains optimal layout without increasing design complexity.
3Area of stationary object
If boundary space between patterns of different colors is reduced, then spatial efficiency is improved, but manufacturing precision may be affected
Solution Approach 1:
The patent applies local quality by assigning different boundary space requirements to different color relationships. Patterns of different colors use a first boundary space that is smaller and optimized for spatial efficiency, while patterns of the same color use a second boundary space that is larger and optimized for manufacturing precision. This localized optimization ensures both spatial efficiency and manufacturing accuracy are maintained in their respective contexts.
Data Source
AI summary
A method of designing a layout of an integrated circuit (IC) includes placing a first cell in the layout, placing a second cell in the layout adjacent to the first cell at a first boundary between the first and second cells, and generating a plurality of commands executable by a processor to form a semiconductor device based on the layout. The first cell includes a first pattern and a second pattern. The first and second patterns are adjacent to the first boundary, the first and second patterns have different colors, and a first boundary space between the first pattern and the first boundary is different from a second boundary space between the second pattern and the first boundary.