IC Manufacturing Control via Correlation Equations
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Solution Overview
Problem
Existing IC manufacturing control methods are limited in their ability to manage result parameters where variables have different physical quantities, such as thickness, implantation concentration, and temperature, as they rely on direct compensation adjustments that are not applicable across all physical quantities.
Innovation Solution
A method that calculates the difference between predicted and target values for each variable using correlation equations and adjusts subsequent process variables to minimize deviations, ensuring that variables with different physical quantities can be effectively controlled across multiple processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If direct compensation adjustment is used to control result parameters, then control precision is improved for variables with same physical quantity, but applicability deteriorates when variables have different physical quantities
Solution Approach 1:
The patent transforms the control approach by changing from direct physical quantity adjustment to indirect parameter transformation. It introduces a target value calculation mechanism that converts different physical quantities (thickness, concentration, temperature) into a unified result parameter space, allowing consistent control methodology across diverse variable types through mathematical transformation rather than direct physical adjustment
Solution Approach 2:
The patent introduces correlation equations as an intermediary layer between process variables and result parameters. These equations serve as mediators that translate relationships between variables with different physical quantities into a common control framework, enabling the control system to handle diverse variables through a unified mathematical interface rather than requiring variable-specific control mechanisms
2Manufacturing precision
If multiple process variables are controlled to minimize result parameter deviation, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent segments the control problem into independent pairwise comparisons between neighboring processes. Instead of managing all variable interactions simultaneously, it divides the complex multi-variable control into simpler sequential steps where each step handles only two adjacent processes, reducing the computational and system complexity while maintaining overall control precision
Solution Approach 2:
The patent implements a feedback mechanism where the actual values of process variables are measured, compared against target values derived from correlation equations, and used to generate correction actions. This closed-loop feedback system automatically adjusts subsequent processes based on deviations detected in earlier processes, maintaining precision without requiring complex manual intervention
Data Source
AI summary
A method of controlling a result parameter of an IC manufacturing procedure is described. The value of at least one first variable of a process correlated with the result parameter is acquired, and the difference between the predicted value and the target value of the result parameter is calculated from the same using a correlation equation of the first variable and the result parameter. A correcting action is then performed to a subsequent process including at least one second variable correlated with the result parameter, which is based on a correlation equation of the second variable and the result parameter to control the subsequent process and adjust the second variable such that the difference is reduced due to the affect of the second variable to the result parameter. The at least one first variable and the at least one second variable include two or more different physical quantities.