Integrated Circuit Process Convergence via Database Overlay
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Solution Overview
Problem
The process qualification for new integrated circuit designs is labor-intensive and expensive due to the need for extensive testing of various parameters for each layer, resulting in a lengthy qualification process.
Innovation Solution
A method is developed to identify and reuse existing structures and processes from previous designs, determining process windows for each structure/process combination, and compiling this information into a database for future use, allowing for the selection of optimal process parameters without repeating extensive testing for new designs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If extensive testing of various parameters is performed for each layer of new integrated circuit designs, then manufacturing precision and reliability are improved, but the time required and cost increase significantly
Solution Approach 1:
The system performs process qualification testing in advance for standard structures and stores the results in a database. When a new design is introduced, pre-qualified processes are retrieved from the database and applied directly, eliminating the need to repeat extensive testing for common structures. This preliminary action significantly reduces qualification time while maintaining manufacturing precision.
Solution Approach 2:
The system creates a digital copy of process qualification data by storing test results in a database. These copied data can be reused across multiple designs without repeating the physical testing process. The copied qualification information is applied to new designs by matching structures, thereby reducing time loss while preserving manufacturing precision through validated process parameters.
2Reliability
If comprehensive process testing is conducted for every new design, then process reliability is improved, but manufacturing cost increases
Solution Approach 1:
Process qualification is performed in advance for standard structures and the results are stored in a database. When new designs are introduced, pre-qualified processes are retrieved and applied directly, eliminating redundant testing costs. This preliminary action maintains reliability by ensuring that validated processes are used while significantly reducing the energy and financial resources required for repeated qualification testing.
Solution Approach 2:
The system recovers and reuses process qualification data from previous designs by storing it in a database. Instead of discarding this valuable information after initial qualification, it is retrieved and applied to new designs that contain similar structures. This recovery and reuse of qualification data maintains process reliability while reducing the cost of repeated testing.
3Manufacturing precision
If process parameters are optimized for each new design, then manufacturing precision is improved, but the complexity of the qualification process increases
Solution Approach 1:
The qualification process is segmented into two distinct parts: (1) initial process qualification for standard structures with results stored in a database, and (2) retrieval and application of pre-qualified processes for new designs. This segmentation reduces the complexity of the overall process by eliminating redundant testing steps while maintaining manufacturing precision through the use of pre-validated process parameters.
Solution Approach 2:
The system creates universal process qualification data that can be applied to multiple different designs. By qualifying processes for standard structures once and storing the results, the same qualification data serves multiple future designs containing similar structures. This universality reduces qualification process complexity while maintaining manufacturing precision across different designs.
Data Source
AI summary
A method for selecting a process for a new integrated circuit design. Structures that are used in existing integrated circuit designs are identified, as well as the photolithography processes that are used to fabricate integrated circuits that are based on the existing designs. A process window is determined for each structure/process combination by running tests on different combinations of process variables, and a database of the process windows is compiled. The structures that are to be used in the new integrated circuit design are identified, and the process windows associated with the identified structures for the new integrated circuit design are selected from the database. The selected process windows for the identified structures are overlaid, grouped by common process, thereby creating a resultant process window for each process. One of the processes is selected, based at least in part on comparative sizes of the resultant process windows.