Integrated Circuit Radiation Immunity via Positive Substrate Bias

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional methods to address single event upsets (SEUs) in integrated circuits, caused by radiation, are ineffective as they increase the SEU rate due to the repelling of minority carriers by highly doped buried layers, leading to data corruption and performance issues.

Innovation Solution

An integrated circuit design featuring an n-type wafer with a p-type epitaxial layer and an n-well, where the n-type wafer is positively biased to attract excess minority carriers, forming reverse-biased p-n junctions to dissipate excess charge, thereby reducing the impact of SEUs without increasing die size.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a highly doped buried P+ layer is used to sink minority carriers, then the recombination rate is improved, but the SEU rate increases due to repelling of minority carriers

Engineering Contradiction:
Improverecombination rateVSAvoidSEU rate
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent inverts the conventional approach by using a lightly doped or intrinsic buried layer instead of a highly doped P+ layer, and by applying positive bias to the n-type substrate to attract minority carriers, thereby resolving the contradiction between recombination rate and SEU rate

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent changes the doping concentration parameter of the buried layer from highly doped to lightly doped or intrinsic, and changes the electrical bias parameter of the substrate from neutral to positive, thereby simultaneously improving recombination rate and reducing SEU rate

Inventive Principle:
Principle #35Parameter changes

2Reliability

If conventional techniques are used to detect and correct data errors, then data corruption is addressed, but the entire memory must be reloaded which reduces productivity

Engineering Contradiction:
Improvedata error detection and correctionVSAvoidmemory operation efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent implements preliminary action by pre-configuring the memory cell structure with reverse-biased p-n junctions and positive substrate bias that automatically sink minority carriers before they can cause data corruption, preventing errors before they occur rather than detecting and correcting them after the fact

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design significantly reduces the SEU rate by effectively attracting and dissipating minority carriers, improving radiation immunity and preventing data corruption without occupying additional area, outperforming conventional CMOS technology and silicon-on-insulator memory cell arrangements.

Implementation Method 1

the n-type wafer is positively biased to attract excess minority carriers in the p-type epitaxial layer

Methodology Applied
Scientific EffectElectrostatic attraction: Electrostatics

Implementation Method 2

forming reverse-biased p-n junctions to dissipate excess charge

Methodology Applied
Scientific EffectCarrier recombination:

Data Source

PatentUS9379109B1Integrated circuit having improved radiation immunity
Publication Date: 2016.06.28 XILINX INC
  • US9379109B1 patent drawing
  • US9379109B1 patent drawing
  • US9379109B1 patent drawing

AI summary

An integrated circuit device having improved radiation immunity is described. The integrated circuit device comprises an n-type wafer having a first surface and a second surface; a p-type epitaxial layer formed on the first surface of the n-type wafer, the p-type epitaxial wafer having first elements storing charge; and an n-well formed in the p-type epitaxial layer, the n-well having second elements storing charge; wherein the n-type wafer is positively biased to attract excess minority carriers in the p-type epitaxial layer. A method of improving radiation immunity in an integrated circuit is also described.