ICP Mass Spectrometer Intermittent Purge Control
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Solution Overview
Problem
The high consumption of Ar gas during purging of the cooling water system in ICP mass analysis devices leads to a significant decrease in Ar gas supply pressure, affecting the operation of other connected devices, as the same Ar gas source is shared among multiple analytical devices.
Innovation Solution
Implementing an intermittent purge control system using a valve control unit to manage the opening and closing of valves, allowing for pressure accumulation and release of Ar gas, reducing the amount of Ar gas needed for purging and minimizing pressure fluctuations by using a pipe resistance in the purge gas flow passage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If continuous purging with Ar gas is performed to drain residual water from the cooling water system, then the residual water is effectively removed, but the Ar gas consumption increases significantly and supply pressure decreases
Solution Approach 1:
The patent implements periodic purging by intermittently opening and closing the purge valve instead of maintaining continuous purging. This periodic action allows pressure to accumulate in the cooling water system during closed periods, then releases the accumulated pressure to drive out residual water during open periods, achieving effective purging with reduced Ar gas consumption
Solution Approach 2:
The patent introduces a pressure accumulation period before actual purging by keeping the purge valve closed for a predetermined time. This preliminary action allows Ar gas pressure to build up in the cooling water system, creating sufficient driving force for effective water removal when the valve is subsequently opened, thereby reducing the total amount of Ar gas needed
2Reliability
If continuous purging with Ar gas is performed to drain residual water from the cooling water system, then the residual water is effectively removed, but the Ar gas supply pressure decreases affecting other connected devices
Solution Approach 1:
By implementing periodic purging with intermittent valve operation, the system allows Ar gas pressure to accumulate during closed periods and then releases it in controlled bursts during open periods. This prevents continuous pressure depletion that would occur with continuous purging, thereby maintaining stable supply pressure for other connected devices
Solution Approach 2:
The predetermined pressure accumulation period before purging allows the Ar gas supply system to maintain stable pressure by building up sufficient pressure in advance. This preliminary pressure buildup ensures that when purging occurs, it does not cause excessive pressure drops that would affect other devices sharing the same gas supply
3Stress or pressure
If a pipe resistance is added to the purge gas flow passage to reduce pressure fluctuations, then pressure stability improves, but the device complexity increases
Solution Approach 1:
The patent introduces a pipe resistance element as an intermediary component in the purge gas flow passage. This element acts as a flow restrictor that smooths pressure fluctuations by controlling the rate of gas flow, thereby stabilizing pressure without requiring complex active control systems
Solution Approach 2:
The patent modifies the flow characteristics by changing the resistance parameter of the piping system. By selecting appropriate pipe dimensions and materials with specific flow resistance properties, the system achieves pressure stabilization through passive parameter optimization rather than active control mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively drains residual water with a reduced Ar gas consumption and maintains stable Ar gas supply pressure, preventing issues like plasma extinction in connected devices.
Implementation Method 1
plasma is generated to ionize the sample gas by applying high frequency voltage to the high frequency coil 18
Implementation Method 2
high frequency inductively coupled plasma
Implementation Method 3
cooling water is supplied from a cooling water system 2 in order to prevent corrosion and melting of the copper sampling cone 13a of the sample introduction unit 13 and of the copper high frequency coil 18
Data Source
AI summary
Provided is an ICP mass spectrometer which is able to effectively discharge residual water by limiting the consumption of Ar gas and a fluctuation in supply pressure of an Ar gas source at the time of an Ar gas purge for a coolant system. The ICP mass spectrometer is provided with: a device body part 1; a coolant system 2 that supplies a coolant from a water source 20 to to-be-cooled structure parts including a high-frequency power supply 12, a high-frequency coil 18, and a sample introduction part 13, which need to be cooled; and an Ar gas supply system 3. Intermediate valves V2, V3 are disposed on the downstream side of a main valve V0, a purge gas channel 32 having a purge valve V1, and a meeting point G of the purge gas channel 32. The to-be-cooled structure parts are connected to a cooling-use pipe on the downstream side of the intermediate valves V2, V3. A valve control part 35 is configured to perform intermittent purge control of repeating accumulation and discharge of the Ar gas on the upstream side of the intermediate valves V2, V3 by intermediately opening and closing the intermediate valves V2, V3 when the Ar gas is being sent.