ICP Emission Spectrometer Aberration Correction via 2D Pixel Selection

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Solution Overview

Problem

Existing ICP emission spectrometers face challenges in achieving excellent wavelength resolution without impairing measurement intensity due to aberrations in the spectroscope, leading to distorted images and reduced ability to detect certain wavelengths, which affects the accuracy of trace impurity element analysis.

Innovation Solution

The use of a two-dimensional detection unit with multiple pixels allows for precise detection of emission light by adjusting the pixels according to the imaging shape, enabling accurate determination of the pixel position for each wavelength, thereby correcting for aberrations and maintaining high intensity measurements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a light emission slit with a fixed hole is used to detect light at different wavelengths, then the spectrometer can operate with a simple structure, but spherical aberration and coma aberration cause image distortion that varies with wavelength, leading to loss of measurement intensity and degraded wavelength resolution

Engineering Contradiction:
Improvespectrometer structureVSAvoidwavelength resolution
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent transitions from a one-dimensional light emission slit to a two-dimensional detection surface with multiple pixels. This dimensional change allows the system to capture the distorted imaging shape at each wavelength and selectively use pixels that correspond to the actual light distribution, thereby compensating for aberration-induced distortion while maintaining simple optical components.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent changes the detection parameter from a fixed geometric slit aperture to a variable pixel selection based on wavelength. By dynamically selecting which pixels to use for detection according to the imaging shape at each wavelength, the system adapts to aberration effects without requiring complex optical correction mechanisms.

Inventive Principle:
Principle #35Parameter changes

2Illumination intensity

If the hole of the light emission slit is increased to maintain measurement intensity, then more light can be detected, but fine wavelength separation becomes unavailable and wavelength resolution is degraded

Engineering Contradiction:
Improvemeasurement intensityVSAvoidwavelength resolution
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by having different pixels serve different functions based on their position on the detection surface. Pixels are selectively activated depending on where the distorted image falls at each wavelength, allowing the system to maintain high intensity detection while preserving wavelength resolution through localized pixel usage rather than a uniform aperture.

Inventive Principle:
Principle #3Local quality

3Device complexity

If the light emission slit position is fixed, then the device structure is simplified, but the imaging shape varies with wavelength due to aberration, causing some light to miss the detection hole and reducing measurement intensity

Engineering Contradiction:
Improveslit drive mechanismVSAvoidmeasurement intensity
Core Design Contradiction:
Device complexityVSIllumination intensity

Solution Approach 1:

The patent replaces the mechanical system of moving the light emission slit with an electronic system of selecting active pixels on a fixed detection surface. This substitution eliminates the need for complex slit drive mechanisms while maintaining the ability to track and detect light at all wavelengths despite aberration-induced image distortion.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Measurement precision

If background position is measured by minutely moving the slit after peak top measurement, then background correction can be performed, but this results in deviation of measurement time and makes it impossible to correct the influence of fluctuations in plasma light

Engineering Contradiction:
Improvebackground correction accuracyVSAvoidmeasurement time deviation
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent performs preliminary action by capturing the entire spectral distribution across all pixels simultaneously. This allows background correction to be performed at any desired position without time delay, as all wavelength information is already captured in the two-dimensional pixel array, enabling real-time correction of plasma light fluctuations.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for simultaneous background correction and improved wavelength resolution without reducing measurement intensity, resulting in more accurate and precise analysis of trace impurity elements.

Implementation Method 1

an inductively coupled plasma generation unit for obtaining atomic emission lines by atomizing or ionizing an analysis-targeted element using inductively coupled plasma

Methodology Applied
Scientific EffectInductively coupled plasma: Electromagnetic Induction

Implementation Method 2

obtain atomic emission lines by atomizing or ionizing an analysis-targeted element using inductively coupled plasma

Methodology Applied
Scientific EffectAtomic emission: Luminescence

Implementation Method 3

a spectroscope for diffracting and detecting the atomic emission lines

Methodology Applied
Scientific EffectDiffraction: Diffraction

Data Source

PatentUS9500524B2ICP emission spectrometer
Publication Date: 2016.11.22 HITACHI HIGH TECH ANALYSIS CORP
  • US9500524B2 patent drawing
  • US9500524B2 patent drawing
  • US9500524B2 patent drawing

AI summary

An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a two-dimensional detection unit and a controller. The two-dimensional detection unit includes a CCD image sensor which has multiple pixels laid in a planar shape and detects emission light by causing the emission light emitted from the spectroscope to be imaged on the multiple pixels. Then, the controller determines a pixel used in detecting the emission light among the multiple pixels in accordance with an imaging shape of detection-targeted emission light.