ICP Window Thickness Layout for Electromagnetic Field Control
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Solution Overview
Problem
Controlling the distribution of the electromagnetic field in inductively coupled plasma processing apparatuses is limited by improvements in antenna shape, structure, and RF systems, necessitating a new approach to achieve desired field distribution.
Innovation Solution
The apparatus includes a main body with a chamber and a window unit featuring multiple windows of varying thickness and material, with a coil forming an electromagnetic field, allowing precise control of the field distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the shape, structure, and RF system of the antenna are improved to control electromagnetic field distribution, then the electromagnetic field distribution control is enhanced, but the device complexity increases
Solution Approach 1:
The patent applies local quality by varying the thickness of different regions of the window unit. Specifically, the window unit has a first region with a first thickness and a second region with a second thickness different from the first thickness. This local variation in thickness allows different parts of the window to control the electromagnetic field differently, achieving precise field distribution control without complicating the overall antenna structure.
Solution Approach 2:
The patent changes physical parameters of the window unit, specifically the thickness parameter, to control electromagnetic field distribution. By adjusting the thickness of different regions of the window unit, the patent achieves control over the electromagnetic field without modifying the antenna's shape, structure, or RF system, thereby avoiding increased device complexity.
2Measurement precision
If multiple windows with different thicknesses and materials are used in the window unit, then the electromagnetic field distribution control precision is improved, but the manufacturing complexity increases
Solution Approach 1:
The patent segments the window unit into multiple regions with different thicknesses (first region with first thickness, second region with second thickness). This segmentation allows each region to be optimized for specific electromagnetic field control requirements while maintaining a unified window unit structure that can be manufactured as a single component, balancing precision control with manufacturing feasibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables efficient and accurate control of the electromagnetic field distribution, enhancing the performance of substrate processing in inductively coupled plasma processing.
Implementation Method 1
a coil in an upper portion of the window unit, wherein the coil is configured to form an electromagnetic field
Implementation Method 2
performing substrate processing by converting a processing gas into plasma with the induced electrical field
Data Source
AI summary
An inductively coupled plasma processing apparatus includes a main body having an internal space; a chamber in the internal space of the main body and having an open upper side and an open lower side; a window unit coupled to an upper portion of the chamber to form a processing space; and a coil in an upper portion of the window unit, wherein the coil is configured to form an electromagnetic field. The main body includes a substrate installation portion configured to receive a substrate so that the substrate is below the chamber. The window unit includes a plurality of windows, and each of the plurality of windows has a respective different thickness and/or a respective different material.