IGBT Barrier Region Impurity Control for Switching Loss Reduction

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Semiconductor devices like diodes and IGBTs face dynamic switching losses due to the reverse recovery process, which is inefficient in removing charge carrier plasma when the pn junction changes from forward to reverse bias.

Innovation Solution

Incorporating a barrier region with a significantly higher impurity concentration than the drift region, forming a homojunction, to control the formation of an inversion layer, thereby optimizing switching characteristics by reducing the effective anode dose and enhancing desaturation efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If a pn junction changes from forward biased to reverse biased, then charge carrier plasma is formed providing low forward resistance, but dynamic switching losses increase due to inefficient reverse recovery process

Engineering Contradiction:
Improvedynamic switching lossesVSAvoidreverse recovery efficiency
Core Design Contradiction:
Loss of energyVSReliability

Solution Approach 1:

The barrier region is pre-formed with high impurity concentration (at least ten times higher than drift region) before switching operations. This preliminary structural configuration enables the inversion layer to be formed more effectively during desaturation cycles, facilitating faster charge carrier removal and reducing dynamic switching losses without compromising reverse recovery efficiency

Inventive Principle:
Principle #10Preliminary action

2Ease of operation

If impurity concentration in barrier region is increased to form homojunction with drift region, then control over inversion layer formation is improved, but device complexity increases

Engineering Contradiction:
Improveinversion layer controlVSAvoidimpurity concentration gradient
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The barrier region is designed with localized high impurity concentration specifically at the interface with the drift region, while maintaining lower impurity concentration in other regions. This local quality differentiation enables precise control over inversion layer formation at the critical homojunction interface without requiring complex impurity gradients throughout the entire device structure

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces dynamic switching losses and improves switching characteristics by allowing a wider spread between anode emitter efficiencies in inversion and non-inversion states, facilitating better tradeoffs between static and dynamic losses.

Implementation Method 1

A control structure is arranged to form an inversion layer in the drift and barrier regions in an inversion state. No inversion layer is formed in the drift and barrier regions in a non-inversion state.

Methodology Applied
Scientific EffectField effect: Electric Field

Implementation Method 2

The barrier and drift regions form a homojunction. A mean impurity concentration in the barrier region is at least ten times as high as an impurity concentration in the drift region.

Methodology Applied
Scientific EffectHomojunction formation:

Implementation Method 3

The barrier and charge carrier transfer regions form a pn junction. Mobile charge carriers flood the semiconductor regions on both sides of a forward biased pn junction

Methodology Applied
Scientific Effectpn junction charge carrier injection:

Data Source

PatentUS9105679B2Semiconductor device and insulated gate bipolar transistor with barrier regions
Publication Date: 2015.08.11 INFINEON TECHNOLOGIES AG
  • US9105679B2 patent drawing
  • US9105679B2 patent drawing
  • US9105679B2 patent drawing

AI summary

In a semiconductor device a barrier region is sandwiched between a drift region and a charge carrier transfer region. The barrier and charge carrier transfer regions form a pn junction. The barrier and drift regions form a homojunction. A mean impurity concentration in the barrier region is at least ten times as high as an impurity concentration in the drift region. A control structure is arranged to form an inversion layer in the drift and barrier regions in an inversion state. No inversion layer is formed in the drift and barrier regions in a non-inversion state.