III-Nitride Power IC Integration to Cut Inductance and Switching Loss

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Solution Overview

Problem

Existing power device technologies face challenges in reducing interconnection inductance and resistance to lower power consumption and increase switching speed, particularly in high voltage applications, as integrated circuits for driving power devices are often separated from the power devices, leading to inefficiencies.

Innovation Solution

An integrated device is formed by positioning an integrated circuit (IC) in a silicon body that also serves as a substrate for a III-nitride power semiconductor device, with vias connecting the IC and power device to enable direct operational coupling, utilizing a silicon substrate with a III-nitride heterojunction and insulation layers to reduce leakage current and improve breakdown voltage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If III-nitride power devices are fabricated using conventional separate substrate architecture, then device fabrication is simplified, but interconnection inductance and resistance increase, leading to higher power consumption and lower switching speed

Engineering Contradiction:
Improvedevice fabrication simplicityVSAvoidpower consumption
Core Design Contradiction:
Ease of manufactureVSLoss of energy

Solution Approach 1:

The patent merges the driver circuit IC and the III-nitride power device onto a single silicon substrate, creating an integrated device architecture. This consolidation eliminates separate interconnection paths, thereby reducing interconnection inductance and resistance while lowering overall power consumption without complicating the fabrication process

Inventive Principle:
Principle #5Merging (Combining)

2Ease of manufacture

If III-nitride power devices are fabricated using conventional separate substrate architecture, then device fabrication is simplified, but interconnection resistance increases, leading to lower switching speed

Engineering Contradiction:
Improvedevice fabrication simplicityVSAvoidswitching speed
Core Design Contradiction:
Ease of manufactureVSSpeed

Solution Approach 1:

The integration of the driver circuit IC and power device on the same silicon substrate creates direct electrical connections between corresponding electrodes. This merging eliminates long external interconnection paths, reducing interconnection resistance and enabling faster switching speeds while maintaining fabrication simplicity

Inventive Principle:
Principle #5Merging (Combining)

3Device complexity

If driver circuit is positioned far from power device, then device complexity is reduced, but interconnection inductance increases, leading to higher power consumption

Engineering Contradiction:
Improvedevice architecture complexityVSAvoidpower consumption
Core Design Contradiction:
Device complexityVSLoss of energy

Solution Approach 1:

The patent positions the driver circuit IC and power device in close proximity on the same silicon substrate, with corresponding electrodes (gate, source, drain) directly aligned and connected. This spatial merging minimizes interconnection inductance and energy loss while the shared substrate provides a straightforward integration platform that does not significantly increase device complexity

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces power consumption and increases switching speed by minimizing interconnection resistance and inductance, enhancing the performance of high voltage power devices through closer integration of ICs and power devices, while improving breakdown voltage and reducing leakage current.

Implementation Method 1

forming a heterojunction structure that includes a buffer layer and a two-dimensional electron gas region for efficient carrier transport

Methodology Applied
Scientific EffectTwo-dimensional electron gas formation:

Data Source

PatentUS20120229176A1Integrated Semiconductor Device
Publication Date: 2012.09.13 INFINEON TECHNOLOGIES AMERICAS CORP
  • US20120229176A1 patent drawing
  • US20120229176A1 patent drawing
  • US20120229176A1 patent drawing

AI summary

A III-nitride device that includes a silicon body having formed therein an integrated circuit and a III-nitride device formed over a surface of the silicon body.