Illumination Mask Generation for High Light Exposure Detection
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Solution Overview
Problem
In environments with varying lighting conditions, such as materials handling facilities, it is challenging to determine events in images due to different light sources, leading to difficulties in identifying areas exposed to high illumination, which can result in overexposed pixels and loss of detail in image data.
Innovation Solution
The method involves generating an illumination mask by comparing current image data with background data to identify pixels exposed to high illumination, combining masks from multiple cameras with overlapping views to create a unified illumination map, and simulating illumination to determine the direction and effect on foreground objects, thereby updating the illumination masks to indicate exposure levels.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If multiple light sources are present in different areas, then the imaging device can capture a wide field of view, but it becomes difficult to determine events in regions exposed to different light sources due to varying illumination conditions
Solution Approach 1:
The patent divides the image into multiple regions and compares each region's illumination characteristics against corresponding background regions. By segmenting the image and processing each region independently, the system can identify which areas are exposed to high illumination despite the presence of multiple light sources, resolving the contradiction between wide field of view and illumination detection difficulty.
2Loss of information
If the imaging device captures images in varying lighting conditions, then more environmental information can be obtained, but overexposed pixels result in loss of detail in image data
Solution Approach 1:
The patent performs preliminary action by comparing current image data with corresponding background data before final processing. This preliminary comparison identifies overexposed pixels and their locations, allowing the system to compensate for detail loss in those specific regions while preserving information from non-overexposed areas, thus maintaining both environmental information coverage and measurement precision.
3Measurement precision
If illumination masks are generated for each camera, then detailed illumination information can be obtained, but the complexity of processing and combining multiple masks increases
Solution Approach 1:
The patent merges illumination masks from multiple cameras by aligning them to a common coordinate system and combining the illumination probability data. This merging process integrates detailed illumination information from all cameras while managing processing complexity through systematic combination methods, achieving comprehensive illumination coverage without proportional increase in processing burden.
Data Source
AI summary
Described is a method for processing image data to determine if a portion of the imaged environment is exposed to high illumination, such as sunlight. In some implementations, image data from multiple different imaging devices may be processed to produce for each imaging device a respective illumination mask that identifies pixels that represent a portion of the environment that is exposed to high illumination. Overlapping portions of those illumination masks may then be combined to produce a unified illumination map of an area of the environment. The unified illumination map identifies, for different portions of the environment, a probability that the portion is actually exposed to high illumination.