Compensating Force Control for Lithographic Illumination Stability

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Lithographic apparatuses face instability in controlling spatial intensity distribution due to radiation bursts, which can alter the orientation of controllable optical elements, leading to unwanted changes in illumination modes and affecting critical dimensions.

Innovation Solution

An array of individually controllable optical elements, with a controller that applies a compensating force to stabilize their orientation during radiation bursts, either by feed-forward correction or pre-adjusting to offset orientations, and optionally surrounding elements with ionized gas to reduce charge-induced movements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If individually controllable optical elements are used to form desired illumination modes, then adaptability and versatility are improved, but stability deteriorates due to radiation bursts altering element orientations

Engineering Contradiction:
Improveillumination mode controlVSAvoidelement orientation stability
Core Design Contradiction:
Adaptability or versatilityVSStability of the object's composition

Solution Approach 1:

The controller applies a compensating force to the optical elements before radiation bursts occur, pre-counteracting the expected radiation pressure effects. This preliminary anti-action prevents the radiation bursts from altering element orientations, thereby maintaining stability while preserving the adaptability of illumination mode control.

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The system implements feedback control by monitoring the orientations of optical elements and adjusting compensating forces in real-time. This feedback mechanism detects deviations caused by radiation bursts and automatically corrects them, ensuring stable element orientations while maintaining the ability to switch between different illumination modes.

Inventive Principle:
Principle #23Feedback

2Stability of the object's composition

If compensating force is applied to maintain element orientations during radiation bursts, then stability is improved, but device complexity increases due to additional control mechanisms

Engineering Contradiction:
Improveillumination mode stabilityVSAvoidcontrol system complexity
Core Design Contradiction:
Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The control system automatically adjusts optical element orientations without requiring external intervention. The controller autonomously detects radiation bursts and applies appropriate compensating forces, making the system self-regulating. This self-service approach maintains stability while minimizing the need for complex external control infrastructure.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system changes operational parameters dynamically by adjusting the orientation of optical elements in response to radiation bursts. By modifying these parameters in real-time through automated control, the system maintains stability without requiring fundamentally complex additional hardware, leveraging parameter adaptation instead.

Inventive Principle:
Principle #35Parameter changes

3Stability of the object's composition

If optical elements are pre-adjusted to offset orientations before radiation bursts, then stability is improved, but productivity decreases due to additional positioning steps

Engineering Contradiction:
Improveelement orientation stabilityVSAvoidillumination setup efficiency
Core Design Contradiction:
Stability of the object's compositionVSProductivity

Solution Approach 1:

The system performs preliminary positioning of optical elements to offset orientations before radiation bursts occur. This preliminary action prepares the elements in advance so that when radiation bursts hit, the elements are already in the correct compensated positions, maintaining stability while minimizing disruption to the overall process flow.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The control system continuously monitors and adjusts element orientations without interrupting the illumination process. By maintaining continuous control rather than discrete positioning steps, the system preserves stability while ensuring uninterrupted productivity, as the adjustments occur seamlessly during normal operation.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the accuracy and stability of illumination modes, maintaining desired orientations during radiation bursts and improving the consistency of critical dimensions in lithographic processes.

Implementation Method 1

a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more of the elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements

Methodology Applied
Scientific EffectRadiation pressure: Radiation Pressure

Implementation Method 2

one or more of the elements are surrounded by an ionized gas

Methodology Applied
Scientific EffectIonized gas: Plasma

Data Source

PatentUS8885144B2Illumination system and lithographic apparatus
Publication Date: 2014.11.11 ASML NETHERLANDS BV
  • US8885144B2 patent drawing
  • US8885144B2 patent drawing
  • US8885144B2 patent drawing

AI summary

An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.