Image Processing Device for Accurate Semiconductor Pattern Matching

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Solution Overview

Problem

Existing pattern matching methods for edge lines and design data in semiconductor manufacturing face challenges in accurately determining correspondence points, leading to decreased matching accuracy due to shape differences between edge lines and design data.

Innovation Solution

An image processing apparatus and computer program that perform positioning between line segments by setting correspondence points and adjusting their positions based on shape differences, using a positioning process unit to calculate alignment degrees and adjust the shape of connecting line segments to achieve accurate alignment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If pattern matching is performed between edge line and design data using conventional methods, then matching can be achieved with some accuracy, but matching accuracy decreases when shape differences exist between edge line and design data

Engineering Contradiction:
Improvematching accuracyVSAvoidcorrespondence point identification accuracy
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The patent changes the parameters of the line segment (shape, orientation, position) to match the edge line shape. By adjusting these parameters, the correspondence points can be accurately identified even when shape differences exist between the original design data and the actual edge line, thereby resolving the contradiction between matching accuracy and correspondence point identification accuracy

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent makes the line segment dynamic by allowing its shape parameters to be adjusted and optimized. The line segment can adaptively change its configuration to best match the edge line shape, enabling accurate correspondence point identification despite shape variations between design data and actual patterns

Inventive Principle:
Principle #15Dynamics

2Ease of operation

If correspondence point is set at a fixed location on straight line with edge line as base point, then positioning can be performed, but wrong correspondence point may be selected depending on edge line shape

Engineering Contradiction:
Improvepositioning operation simplicityVSAvoidcorrespondence point selection accuracy
Core Design Contradiction:
Ease of operationVSMeasurement precision

Solution Approach 1:

The patent performs preliminary shape analysis of the edge line before setting correspondence points. By pre-adjusting the line segment parameters to match the edge line shape, the system ensures that correspondence points are selected at accurate locations, preventing wrong point selection while maintaining operational simplicity

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses the edge line shape as feedback to adjust the line segment parameters. The system continuously compares the line segment shape with the edge line shape and modifies the correspondence point positions accordingly, ensuring accurate point selection regardless of edge line shape variations

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS9165214B2Image processing device and computer program
Publication Date: 2015.10.20 HITACHI HIGH TECH CORP
  • US9165214B2 patent drawing
  • US9165214B2 patent drawing
  • US9165214B2 patent drawing

AI summary

The purpose of the present invention is to provide an image processing apparatus and a computer program such that correspondence points between design data and an edge line or between edge lines can be accurately identified for their matching. In an embodiment for achieving the purpose, when positioning between a first pattern formed by a first line segment and a second pattern formed by a second line segment is performed, a first correspondence point and a second correspondence point are set on the first line segment and the second line segment, respectively; a degree of alignment for performing the positioning of the first pattern and the second pattern is calculated on the basis of the distance between the first correspondence point and the second correspondence point; and the position of the first correspondence point and/or the second correspondence point is changed in accordance with a shape difference between the first line segment and the second line segment (see FIG. 2).