Image Processing Apparatus Mask Pattern Segmentation
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Solution Overview
Problem
In image recording apparatuses, spatial deviations in recording data occur when quantization patterns and mask patterns are determined in an uncorrelated manner, leading to image quality degradation, and existing solutions restrict the degree of freedom in setting quantization patterns based on conveyance amounts.
Innovation Solution
An image processing apparatus that generates recording data using quantization patterns and mask patterns associated with each other, allowing for flexible setting of quantization patterns across multiple scanning operations without degrading their degree of freedom, by using a distribution unit to apply mask patterns corresponding to parts of the quantization pattern, ensuring synchronized dither and mask patterns for each scanning operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If quantization pattern and mask pattern are determined in an uncorrelated manner, then the degree of freedom in setting quantization patterns is maintained, but spatial deviation occurs in the image leading to image quality degradation
Solution Approach 1:
The mask pattern is divided into multiple mask pattern parts corresponding to different areas of the quantization pattern. This segmentation allows independent determination of mask pattern parts while maintaining their association with specific quantization pattern areas, thus preserving spatial relationships without restricting the overall degree of freedom in pattern setting.
Solution Approach 2:
Different mask pattern parts are determined to correspond to different areas of the quantization pattern, creating local associations between quantization and mask patterns. This local quality approach reduces spatial deviation in specific image areas while maintaining flexibility in overall pattern configuration.
2Manufacturing precision
If quantization pattern is set in accordance with conveyance amount, then spatial deviation is reduced, but the degree of freedom in setting quantization pattern is degraded
Solution Approach 1:
The mask pattern is segmented into multiple parts that can be independently determined and associated with different areas of the quantization pattern. This allows the system to achieve spatial deviation reduction through local associations without requiring the entire quantization pattern to be constrained by conveyance amount specifications.
Solution Approach 2:
The association between quantization pattern areas and mask pattern parts is made flexible and adaptable. The system dynamically determines which mask pattern part corresponds to which quantization pattern area, allowing the degree of freedom to be maintained while still achieving spatial deviation reduction through appropriate local associations.
3Manufacturing precision
If mask pattern is determined while being associated with quantization pattern, then spatial deviation is suppressed, but the flexibility in pattern determination is reduced
Solution Approach 1:
By segmenting the mask pattern into multiple parts, each associated with specific areas of the quantization pattern, the system achieves spatial deviation suppression through local associations while maintaining flexibility in overall pattern determination. Each mask pattern part can be independently determined without constraining the entire pattern system.
Solution Approach 2:
Instead of determining the entire mask pattern in strict association with the quantization pattern, the invention applies partial association only where necessary (in specific areas), leaving other areas with greater flexibility. This partial action approach suppresses spatial deviation in critical areas while maintaining ease of operation overall.
Data Source
AI summary
With respect to an area quantized by using an area of part in a quantization pattern and also without using an area of the other part in the quantization pattern in quantized data, a mask pattern part corresponding to the area of the part among mask pattern parts constituted by dividing a mask pattern is applied.