Image Sensor Light-Shielding Layer Adhesion
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional image sensor devices face issues with uneven exposure and non-uniformity in patterning due to photolithography techniques, leading to increased fabrication costs and time, and the metal patterns used for light-shielding and electromagnetic interference often peel or crack during cleaning, reducing product yield.
Innovation Solution
A method involving energy-induced swelling sacrificial elements and a polymer light-shielding layer is used to form an electromagnetic interference pattern with an opening, where a second sacrificial element covers the center region, and a light-shielding layer is applied to protect the peripheral region, ensuring the light transmitting region is not damaged during cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If photolithography techniques are used to form light-shielding patterns on microlenses, then light-shielding patterns can be formed, but uneven exposure and non-uniformity occur during patterning
Solution Approach 1:
A polymer layer is introduced as an intermediary between the microlens and the light-shielding metal pattern. This polymer layer acts as a buffer that prevents direct interaction between the metal pattern and the curved lens surface, eliminating the peeling and cracking issues that occur with conventional photolithography direct patterning on microlenses.
Solution Approach 2:
The polymer layer is formed on the microlens surface before the light-shielding metal pattern is deposited. This preliminary action creates a protective foundation that ensures uniform patterning and prevents subsequent manufacturing defects during cleaning and assembly processes.
2Object-affected harmful factors
If metal patterns are used for electromagnetic interference shielding, then electromagnetic interference can be blocked, but the metal patterns peel or crack during cleaning steps
Solution Approach 1:
The polymer layer serves as a mediator between the metal electromagnetic interference shielding pattern and the cleaning process. It provides a compliant interface that absorbs stress during cleaning, preventing the metal pattern from peeling or cracking while maintaining electromagnetic shielding effectiveness.
Solution Approach 2:
The invention changes the physical and chemical parameters of the interface between the metal pattern and the lens surface by introducing the polymer layer. This modification alters the adhesion characteristics and mechanical compliance, enabling the metal pattern to withstand cleaning processes without degradation.
3Ease of manufacture
If photolithography techniques are used for patterning, then light-shielding patterns can be formed, but fabrication costs and time increase
Solution Approach 1:
The polymer layer is deposited using conformal deposition techniques that are simpler and more efficient than photolithography. This intermediary approach eliminates complex photolithography steps including photoresist coating, patterning, and development, thereby reducing fabrication time and costs while achieving the same light-shielding function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach prevents peeling, rising, or cracking of the electromagnetic interference pattern, maintaining product yield and reducing fabrication costs by ensuring the light transmitting region remains intact during cleaning.
Implementation Method 1
forming a first sacrificial element on the lens; forming an electromagnetic interference layer on the lens and the first sacrificial element; removing the first sacrificial element and the electromagnetic interference layer on the first sacrificial element
Implementation Method 2
a polymer light-shielding layer is used to form an electromagnetic interference pattern with an opening, where a second sacrificial element covers the center region, and a light-shielding layer is applied to protect the peripheral region, ensuring the light transmitting region is not damaged during cleaning
Data Source
AI summary
A method for forming an image sensor device is provided. First, a lens is provided and a first sacrificial element is formed thereon. An electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens. A peripheral region of the selected portion of the lens remains exposed. A light-shielding layer is formed on the electromagnetic interference pattern, second sacrificial element, and peripheral region of the selected portion of the lens. The second sacrificial element and light-shielding pattern are removed to expose the center region of the selected portion of the lens as a light transmitting region.