Image Sensor Micro-Lens Array LTO Layer Delamination Prevention

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Solution Overview

Problem

The manufacturing of image sensors faces challenges such as delamination of capping layers due to stress differences and the attachment of polymer particles to micro-lens arrays, which reduces sensitivity and yield rate, particularly in CMOS image sensors during wafer back grinding and packaging processes.

Innovation Solution

The implementation of a Low Temperature Oxide (LTO) layer on the micro-lens array, combined with a thermo-setting resin layer and passivation layers, to prevent delamination and particle attachment, while ensuring a zero gap between adjacent lenses for enhanced sensitivity and yield.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If a capping layer is used in CMOS image sensor manufacturing, then the structural integrity is improved, but delamination occurs due to stress difference between layers

Engineering Contradiction:
Improvestructural integrityVSAvoidlayer adhesion
Core Design Contradiction:
StrengthVSReliability

Solution Approach 1:

A stress compensation layer is introduced between the capping layer and the substrate to act as a mediator that absorbs and balances the stress difference between layers, preventing delamination while maintaining structural integrity

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If photoresist layer is used in manufacturing processes, then the fabrication capability is improved, but polymer particles are generated and attach to micro-lens array

Engineering Contradiction:
Improvefabrication capabilityVSAvoidparticle contamination
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The harmful polymer particles are extracted and removed from the system by applying oxygen plasma treatment to the micro-lens array, eliminating particle contamination while preserving the fabrication benefits of photoresist usage

Inventive Principle:
Principle #2Taking out (Extraction)

3Measurement precision

If micro-lens array is cleaned to remove particles, then the sensitivity is improved, but the cleaning difficulty reduces yield rate

Engineering Contradiction:
ImprovesensitivityVSAvoidyield rate
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

Oxygen plasma treatment is applied in advance to the micro-lens array to prevent polymer particle attachment before they can contaminate the surface, eliminating the need for difficult cleaning operations and maintaining high yield rate

Inventive Principle:
Principle #10Preliminary action

4Measurement precision

If zero gap between lenses is achieved, then the light conversion sensitivity is improved, but the manufacturing precision requirement increases

Engineering Contradiction:
Improvelight conversion sensitivityVSAvoidgap control precision
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The physical and chemical parameters of the lens material are optimized, including refractive index, curing characteristics, and shrinkage properties, to enable self-alignment and automatic gap closure during the curing process, achieving zero gap without requiring extreme manufacturing precision

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves the sensitivity and yield rate of image sensors by preventing delamination and particle attachment, maintaining lens array integrity and optimizing light conversion efficiency.

Implementation Method 1

delamination of a capping layer may occur in a pad open section, the pad of which serves for signal connection with exterior signal lines, due to a stress difference between layers of and/or over the pad

Methodology Applied
Scientific EffectStress compensation:

Implementation Method 2

in a wafer back grinding process, a packaging process and the like, polymer particles derived from the photoresist layer and the like may be generated and may attach to the micro-lens array

Methodology Applied
Scientific EffectParticle adhesion prevention:

Implementation Method 3

An image sensor is a semiconductor device that converts an optical image into electrical signals. Such an image sensor includes a micro-lens array that guides incident light toward a photodiode

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS7695995B2Image sensor and method of fabricating the same
Publication Date: 2010.04.13 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US7695995B2 patent drawing
  • US7695995B2 patent drawing
  • US7695995B2 patent drawing

AI summary

Disclosed is an image sensor. The image sensor includes a lower structure having a photodiode and an interconnection, a passivation layer on the lower structure, a thermo-setting resin layer on the passivation layer, a color filter array on the thermo-setting resin layer, a micro-lens array on the color filter array, and a Low Temperature Oxide (LTO) layer on the micro-lens array.