Image Sensor Pixel Array Panchromatic Integration
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Solution Overview
Problem
Conventional pixel arrays in image sensors require additional photo masks for fabricating panchromatic pixels, increasing manufacturing complexity and cost.
Innovation Solution
A pixel array with integrated panchromatic and planarization layers formed using a single process, eliminating the need for extra photo masks by depositing planarization material to define both the panchromatic pixel and planarization layer simultaneously.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate photo masks are used to define color pixels and panchromatic pixels, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent combines the definition of color pixels and panchromatic pixels into a single photo mask layer. The planarization material layer serves dual purposes: it defines the panchromatic pixel regions and provides planarization for the color pixels simultaneously, eliminating the need for separate photo masks and reducing manufacturing process complexity while maintaining precise pixel pattern definition
Solution Approach 2:
The planarization material layer performs multiple functions: it acts as a mask to define panchromatic pixels, provides planarization for the color pixel array, and forms the structural basis for the panchromatic pixel regions. This multi-functional approach reduces the total number of manufacturing steps and materials required
2Manufacturing precision
If extra photo masks are used for panchromatic pixels, then manufacturing precision is improved, but manufacturing cost increases
Solution Approach 1:
The patent merges the panchromatic pixel definition function with the planarization process into a single step. By using the planarization material layer as both the defining mask and the planarization medium, the invention eliminates the need for additional photo masks and associated materials, directly reducing manufacturing costs while maintaining precise pixel pattern definition
Solution Approach 2:
The patent extracts the panchromatic pixel definition function from the traditional multi-mask photo lithography process and integrates it into the planarization material deposition step. This extraction eliminates redundant manufacturing steps and material costs associated with separate photo masks
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Simplifies the manufacturing process and reduces costs while maintaining improved sensitivity by integrating the panchromatic pixel and planarization layer structure.
Implementation Method 1
filling a planarization material during a second process to form a panchromatic pixel on the substrate and a planarization layer on the first color pixel and the panchromatic pixel
Data Source
AI summary
A pixel array of an image sensor includes multiple red, green, blue and panchromatic pixels. The red, green and blue pixels are formed on a substrate during a first process. Planarization material is deposited to form the panchromatic pixels on the substrate and to form a planarization layer on the red, green and blue pixels during the same second process subsequent to the first process. The planarization material of the panchromatic pixels and the planarization layer is characterized in high transmittance and high aspect ratio.