Image Sensor Resonator Structure With Region-Specific Insulating Layers

The patent applies local quality by implementing insulating layers with different thicknesses in different pixel regions. Specifically, a first insulating layer with a first thickness is formed over a first pixel region, and a second insulating layer with a second thickness (greater than the first) is formed over a second pixel region. This allows each region to be optimized for specific wavelength ranges, enhancing the overall light wavelength handling capability while maintaining a relatively simple manufacturing process using standard deposition techniques.

The patent segments the insulating layer structure into multiple distinct layers with different thicknesses rather than using a single uniform layer. This segmentation allows each layer to be independently optimized and controlled, making it easier to achieve precise thickness control in a thin overall structure. The multi-layer approach breaks down the complex precision requirement into manageable individual layer specifications.

The patent implements multi-functionality by designing the resonator structure with metal layers and insulating layers that serve multiple purposes simultaneously. The resonator structure not only provides mechanical support but also functions as a wavelength-selective filter. The different thicknesses of insulating layers enable the same basic structure to handle multiple wavelength ranges, reducing the need for additional specialized components and thereby limiting the increase in overall device complexity.