Image Sensor Color Filter Coating With Vortex Flow Control
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Solution Overview
Problem
High-pixel CMOS image sensors face performance issues due to stains on the color filter, which are exacerbated by the semiconductor manufacturing process, leading to irregularities and distortions in image generation.
Innovation Solution
A manufacturing method involving the creation of vortex generating patterns at regular intervals between the sensor array and pads on the substrate, allowing for uniform photo resist coating and minimizing stains during the image sensor production process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If photo resist is coated during substrate rotation to create color filter, then color filter formation is achieved, but stains occur on the color filter
Solution Approach 1:
Vortex generating patterns are introduced as intermediary structures between the pad area and sensor array area. These patterns mediate the photo resist flow by creating controlled vortices that prevent direct contact between irregular photo resist flow and the sensor array, thereby eliminating stains while maintaining color filter formation
Solution Approach 2:
Vortex generating patterns are formed in advance before photo resist coating. These pre-formed patterns prepare the surface topology to guide and control the subsequent photo resist flow, ensuring uniform coating by preventing stagnation and irregular flow accumulation before the coating process begins
2Measurement precision
If pixel density is increased to improve image sensor performance, then resolution is enhanced, but stains on color filter become more problematic
Solution Approach 1:
The vortex generating patterns serve as a buffer zone that decouples the pad area from the sensor array area. This intermediary structure ensures that even at high pixel densities where stains are more critical, the photo resist flow is controlled and uniform, maintaining both resolution and reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method reduces or eliminates stains on the color filter, enhancing the reliability and image generating performance of the image sensor by ensuring uniform photo resist coating and reducing process defects.
Implementation Method 1
coating a photo resist while rotating the substrate based on operating the equipment
Implementation Method 2
forming a plurality of vortex generating patterns at regular intervals between the plurality of pads and the sensor array
Data Source
AI summary
A manufacturing method of an image sensor includes inputting a substrate in an equipment, wherein a sensor array and a plurality of pads are on the substrate; forming a plurality of vortex generating patterns at regular intervals between the plurality of pads and the sensor array; and coating a photo resist while rotating the substrate based on operating the equipment.