X-ray Imaging Panel Polygonal Photoelectric Layer
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Solution Overview
Problem
X-ray imaging panels with rectangular photoelectric conversion layers are prone to etching damage at corner portions, leading to increased leakage current due to uneven resist exposure and anisotropic etching, which results in recessed semiconductor film ends.
Innovation Solution
Designing an X-ray imaging panel with a photoelectric conversion layer having a polygonal shape featuring corner portions with interior angles greater than 90°, which reduces the difference in resist exposure between corner and side portions, minimizing etching damage by maintaining identical taper angles during dry etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a rectangular photoelectric conversion layer is used, then the manufacturing process is simple, but the corner portions suffer from uneven resist exposure and anisotropic etching damage leading to increased leakage current
Solution Approach 1:
The patent applies asymmetry by changing the corner geometry from standard 90-degree angles to obtuse angles (greater than 90 degrees). This asymmetric modification to the corner portions eliminates the uneven resist exposure problem while maintaining the overall rectangular structure for manufacturing simplicity.
Solution Approach 2:
The patent applies local quality by modifying only the corner portions of the photoelectric conversion layer while keeping the main body rectangular. The corner portions have obtuse angles to prevent etching damage, while the rest of the structure maintains the simple rectangular geometry for ease of manufacture.
2Productivity
If dry etching is performed with rectangular resist, then the etching process is efficient, but the corner portions are recessed inward due to anisotropic etching
Solution Approach 1:
The resist pattern uses obtuse angles at corner portions instead of standard 90-degree angles. This asymmetric design ensures that during anisotropic dry etching, the resist maintains uniform thickness and prevents inward recession, achieving both efficient etching and precise corner formation.
Solution Approach 2:
The patent performs preliminary action by designing the resist pattern with obtuse angles before the etching process. This pre-planned geometric configuration prevents etching damage from occurring in the first place, rather than attempting to correct it afterward.
3Ease of manufacture
If standard rectangular patterning is used, then the exposure process is straightforward, but the corner portions have smaller taper angles causing resist recession
Solution Approach 1:
The patent introduces asymmetry in the corner portions of the resist pattern by using obtuse angles instead of standard 90-degree angles. This maintains straightforward patterning for the main body while ensuring uniform taper angles at corners to prevent resist recession.
Solution Approach 2:
The patent applies local quality by modifying only the corner regions of the resist pattern with obtuse angles while keeping the main body patterning simple and straightforward. This localized modification ensures uniform taper angles where needed without complicating the overall patterning process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polygonal shape of the photoelectric conversion layer reduces leakage current by minimizing etching damage in corner portions, ensuring uniform resist recess levels and improved X-ray detection sensitivity.
Implementation Method 1
a photoelectric conversion layer that is provided on the substrate and converts scintillation light into charges
Implementation Method 2
generates an image based on scintillation light that is obtained from X-rays transmitted through an object
Data Source
AI summary
Provided is an X-ray imaging panel in which leakage current can be reduced, and a method for producing the same. An imaging panel 1 generates an image based on scintillation light that is obtained from X-rays transmitted through an object. The imaging panel 1 includes a photoelectric conversion layer 15 that converts scintillation light into charges, on a substrate. The photoelectric conversion layer 15 has a polygonal shape having a plurality of corner portions 15p when viewed in a plan view. Each of the corner portions 15p has a plurality of corners each of which has an interior angle of greater than 90°.