Imaging Unit Positioning for Substrate Peripheral Film Removal
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Solution Overview
Problem
Existing substrate processing systems face issues with successful imaging due to liquid adherence on the imaging unit when processing substrates, as the imaging unit is positioned to face the peripheral portion of the substrate during processing.
Innovation Solution
A substrate processing apparatus is designed with an imaging unit placed in front of the arrival region of the processing liquid, allowing it to image the peripheral portion of the substrate while preventing liquid from adhering to the imaging device by positioning the imaging unit to view the substrate before the liquid arrives, thus ensuring successful imaging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the imaging unit is disposed at a position facing the peripheral portion of the substrate, then the imaging unit can image the peripheral portion of the substrate, but the processing liquid adheres to or is coated on the imaging unit, preventing successful imaging
Solution Approach 1:
The imaging unit is repositioned from a conventional location to a specific angular position relative to the substrate rotation direction. By positioning it in front of the arrival region of processing liquid with respect to the rotational direction, the imaging unit operates in a spatial dimension where liquid does not reach, eliminating liquid adherence while maintaining imaging capability of the peripheral portion.
Solution Approach 2:
The imaging unit is strategically positioned upstream of the liquid arrival region before the processing liquid reaches the imaging area. This preliminary positioning ensures that imaging occurs in a zone free from liquid contamination, preventing the harmful effect before it can occur.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables successful imaging of the substrate's peripheral portion even when the imaging device is facing the processing area, preventing liquid adherence and maintaining image quality.
Implementation Method 1
a rotating/holding unit configured to hold and rotate the substrate
Implementation Method 2
a first processing liquid supply unit configured to supply a first processing liquid for removing the film onto the peripheral portion of the substrate
Implementation Method 3
an imaging unit provided at a position in front of an arrival region of the first processing liquid on the substrate with respect to the first rotational direction, and configured to image the peripheral portion of the substrate
Data Source
AI summary
Imaging can be performed well even when an imaging device is disposed at a position facing a peripheral portion of a substrate. A substrate processing apparatus 16 which performs a processing of removing a film on a peripheral portion of a substrate W includes a rotating/holding unit 210 configured to hold and rotate the substrate; a first processing liquid supply unit 250A configured to supply a first processing liquid for removing the film onto the peripheral portion of the substrate while the substrate is being rotated in a first rotational direction R1 by the rotating/holding unit; and an imaging unit 270 provided at a position in front of an arrival region 902 of the first processing liquid on the substrate with respect to the first rotational direction R1, and configured to image the peripheral portion of the substrate.