Imide Acid Generator for Chemically Amplified Resist Resolution
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current chemically amplified resist compositions lack a novel imide compound that effectively functions as an acid generator, leading to suboptimal performance in lithographic processes, particularly in terms of resolution and pattern profile.
Innovation Solution
A novel imide compound represented by the formula (I) is introduced, which can be used to create a chemically amplified resist composition. This imide compound is synthesized through a reaction between specific compounds in the presence of a base, and it serves as an acid generator, enhancing the resist composition's performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in chemically amplified resist compositions, then the resist composition can perform basic lithographic functions, but the resolution and pattern profile are suboptimal
Solution Approach 1:
The patent modifies the chemical structure of acid generators by introducing specific imide compounds with defined molecular formulas (I), (II), and (III) containing particular functional groups and substituents. These structural parameter changes enhance the acid generation capability and improve resolution while maintaining reliability in chemically amplified resist compositions
Solution Approach 2:
The patent develops composite acid generator systems by combining the novel imide compounds with specific resins (polymerizable monomers and polymers) to create optimized resist compositions. This composite approach synergistically improves both the acid generation effectiveness and the resulting resolution/pattern profile
2Productivity
If existing imide compounds are used as acid generators, then the resist composition maintains stability, but it lacks the enhanced performance required for advanced lithographic techniques
Solution Approach 1:
The patent introduces specific functional groups and substituents at particular positions within the imide compound molecular structure (as defined in formulas I and II with specific R1, R2, R3, R4, R5, R6, W1, W2, Q1, Q2 parameters). This localized structural optimization enhances acid generation performance for advanced lithography without requiring complete molecular redesign, thus improving productivity while controlling complexity
Solution Approach 2:
The patent divides the acid generator functionality into modular imide compound structures with separable functional regions (imide core, substituent groups, and side chains). This segmentation allows independent optimization of different molecular regions to enhance lithographic performance while maintaining manageable molecular complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The novel imide compound improves the resist composition's ability to generate acid, resulting in better resolution and pattern profile, making it suitable for advanced lithographic techniques like ArF excimer laser lithography, KrF excimer laser lithography, and ArF immersion lithography.
Implementation Method 1
The imide compound serves as an acid generator, enhancing the resist composition's performance
Data Source
AI summary
An imide compound represented by the formula (I):wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1):wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.