Imide Ring Charge Control for Photosensitive Polymer Hydrolysis

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Solution Overview

Problem

Conventional negative-type photosensitive polymers experience reduced mechanical strength due to hydrolysis and require improved solubility in general solvents used in varnishes.

Innovation Solution

A negative-type photosensitive polymer with a structural unit containing an imide ring, where the average positive electric charge of carbonyl carbons is within a specific range, inhibiting hydrolysis and enhancing solubility in organic solvents, is developed. This polymer includes a group with a terminal double bond and specific molecular structures that ensure excellent solvent solubility and resistance to hydrolysis.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional negative-type photosensitive polymer with an imide ring is used to achieve insolubility in alkali developing solution after exposure, then the shrinkage of the film during curing is reduced and high rectangular pattern is obtained, but mechanical strength such as elongation is reduced due to hydrolysis

Engineering Contradiction:
Improverectangular pattern qualityVSAvoidmechanical strength (elongation)
Core Design Contradiction:
Manufacturing precisionVSStrength

Solution Approach 1:

The invention changes the chemical parameter of the imide ring by controlling the average positive electric charge of carbonyl carbons to be within a specific range (0.085 to 0.099). This parameter change simultaneously achieves insolubility in alkali developing solution after exposure (maintaining rectangular pattern quality) and resistance to hydrolysis (maintaining mechanical strength and elongation).

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite molecular structure combining an imide ring with specific organic groups (where the average positive electric charge of carbonyl carbons is controlled to 0.085-0.099). This composite structure integrates both the alkaline resistance needed for pattern formation and the hydrolysis resistance needed for mechanical strength, resolving the contradiction between manufacturing precision and strength.

Inventive Principle:
Principle #40Composite materials

2Strength

If a negative-type photosensitive polymer is designed for high mechanical strength and hydrolysis resistance, then elongation is maintained, but solubility in general solvents used in varnishes may be compromised

Engineering Contradiction:
Improvemechanical strength (elongation)VSAvoidsolubility in varnish solvents
Core Design Contradiction:
StrengthVSEase of manufacture

Solution Approach 1:

The invention adjusts the solubility parameter by controlling the average positive electric charge of carbonyl carbons in the imide ring to be within 0.085 to 0.099. This parameter optimization enables the polymer to maintain both high mechanical strength (resistance to hydrolysis) and excellent solubility in general varnish solvents, eliminating the need for specialized solvent systems.

Inventive Principle:
Principle #35Parameter changes

3Strength

If the average positive electric charge of carbonyl carbons in the imide ring is reduced to inhibit hydrolysis, then mechanical strength is maintained, but the structural design becomes more constrained

Engineering Contradiction:
Improvemechanical strength (elongation)VSAvoidstructural design flexibility
Core Design Contradiction:
StrengthVSDevice complexity

Solution Approach 1:

The invention establishes a specific parameter range (average positive electric charge of 0.085 to 0.099) that defines the optimal structural configuration. Within this range, the polymer achieves hydrolysis resistance while maintaining design flexibility for various organic groups (X, Y, Z definitions in the patent), balancing structural constraints with performance requirements.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The polymer maintains excellent mechanical strength and solubility in organic solvents, minimizing the reduction in elongation and providing a cured product with enhanced properties for semiconductor applications.

Implementation Method 1

negative-type photosensitive polymer which has a structural unit containing an imide ring, the negative-type photosensitive polymer containing a group having a terminal double bond

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

hydrolysis is inhibited when positive electric charges of carbonyl carbons of the imide ring are within a predetermined range

Methodology Applied
Scientific EffectHydrolysis resistance: Hydrolysis

Data Source

PatentUS20240301115A1Negative-type photosensitive polymer, polymer solution, negative-type photosensitive resin composition, cured film, and semiconductor device
Publication Date: 2024.09.12 SUMITOMO BAKELITE CO LTD
  • US20240301115A1 patent drawing
  • US20240301115A1 patent drawing
  • US20240301115A1 patent drawing

AI summary

A negative-type photosensitive polymer of the present invention is a solvent-soluble negative-type photosensitive polymer which has a structural unit containing an imide ring, the negative-type photosensitive polymer containing a group having a terminal double bond, in which an average value of positive electric charges (δ+) of two carbonyl carbons of the imide ring is equal to or less than 0.099 as calculated by a charge equilibration method.