Immersion Lithography Barrier Layer for Defect Reduction
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Solution Overview
Problem
Immersion lithography faces challenges in achieving smaller feature dimensions and tighter pitches due to limitations in lithographic processes, particularly with immersion-related defects and degraded aerial image contrast.
Innovation Solution
Incorporating a hydrophobic and contrast-enhancing barrier layer between the immersion liquid film and the photo-resist layer, which can be formed by depositing a fluoro-carbon and acrylate chromophore layer or by migrating barrier-forming components from the photo-resist layer, to prevent defects and enhance image contrast.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If immersion lithography is used to achieve smaller feature dimensions and tighter pitches, then manufacturing precision is improved, but immersion-related defects and degraded aerial image contrast occur
Solution Approach 1:
A barrier layer is introduced as an intermediary component between the immersion liquid film and the photo-resist layer. This barrier layer mediates the interaction between the immersion liquid and photo-resist, preventing harmful effects such as defects and contrast degradation while maintaining the benefits of immersion lithography for achieving smaller feature dimensions and tighter pitches.
Solution Approach 2:
The barrier layer is applied specifically at the interface between the immersion liquid and photo-resist, where the harmful interactions occur. This localized application addresses the immersion-related defects and contrast issues at the critical interface without affecting other areas of the lithographic system, thereby maintaining manufacturing precision while eliminating harmful factors.
2Illumination intensity
If a barrier layer is added to prevent immersion-related defects and enhance contrast, then aerial image contrast is improved, but device complexity increases
Solution Approach 1:
The barrier layer is implemented as a thin film structure that can be deposited or formed on the photo-resist layer. This thin film approach enhances aerial image contrast by preventing immersion liquid interaction with the photo-resist, while minimizing the increase in device complexity through the use of a relatively simple, thin-layer structure rather than a bulky or complex system modification.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The hydrophobic and contrast-enhancing barrier layer reduces immersion-related defects and improves the contrast of the aerial image, enabling more precise patterning and reducing leaching of resist components, thus enhancing the overall performance of immersion lithography.
Implementation Method 1
a hydrophobic and contrast-enhancing barrier layer is used between an immersion liquid film and a photo-resist layer
Implementation Method 2
forming a layer composed of a fluoro-carbon and an acrylate chromophore
Data Source
AI summary
A method for patterning a photo-resist in an immersion lithography process is described. The method includes forming a photo-resist layer above a substrate. A hydrophobic and contrast-enhancing barrier layer is formed above the photo-resist layer. The photo-resist layer is exposed, through the hydrophobic and contrast-enhancing barrier layer, to a light source. The photo-resist layer is developed to provide a patterned photo-resist layer.