Immersion Liquid Meniscus Damping for Faster Lithography Scanning
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Solution Overview
Problem
The presence of droplets and bubbles in immersion liquid during lithographic processes leads to defects on the substrate, limiting the throughput of the lithographic apparatus due to the need to reduce the relative speed of the substrate to maintain meniscus stability.
Innovation Solution
A fluid handling system with a damper configured to support the meniscus of immersion liquid between a surface of the damper and the substrate, allowing for faster substrate movement by stabilizing the meniscus and reducing the risk of droplet formation and bubble introduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the relative speed of the substrate is reduced to maintain meniscus stability, then droplet formation and bubble introduction are reduced, but the throughput of the lithographic apparatus is limited
Solution Approach 1:
The patent applies the dynamics principle by making the meniscus position adjustable rather than fixed. The meniscus can move dynamically to adapt to different substrate speeds, allowing the system to maintain stability at higher velocities. This is achieved through a fluid handling structure that enables controlled meniscus displacement along the substrate surface.
Solution Approach 2:
The patent changes the parameter of meniscus position to optimize performance. By adjusting where the meniscus is located along the substrate surface, the system can accommodate higher substrate speeds without compromising stability. This parameter adjustment allows the liquid confinement structure to effectively manage the immersion liquid at increased velocities.
2Manufacturing precision
If immersion liquid is used to improve resolution of smaller features, then the effective numerical aperture is increased, but droplets and bubbles are introduced causing printed defects
Solution Approach 1:
The patent extracts or removes harmful elements (droplets and bubbles) from the immersion liquid system. The fluid handling structure is designed to prevent droplet formation and bubble introduction by carefully managing the immersion liquid confinement, thereby maintaining the resolution benefits while eliminating the harmful effects.
Solution Approach 2:
The patent introduces a fluid handling structure as an intermediary between the immersion liquid and the substrate. This intermediary component manages the liquid confinement and meniscus formation, preventing direct harmful interactions that would cause droplets and bubbles while still allowing the immersion liquid to provide its refractive index benefits for improved resolution.
3Manufacturing precision
If a fluid handling structure is used to confine immersion liquid, then imaging of smaller features is enabled, but the meniscus becomes unstable at high substrate speeds
Solution Approach 1:
The patent makes the meniscus dynamic rather than static. The fluid handling structure allows the meniscus to move and adapt its position along the substrate surface in response to varying substrate speeds, maintaining stability and preventing breakdown even at high velocities while preserving the imaging precision benefits.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances throughput by enabling faster substrate movement while minimizing defects caused by unstable menisci and gas bubbles, thus improving the efficiency of the lithographic process.
Implementation Method 1
the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate
Data Source
AI summary
A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a damper arranged between a first extraction member and a second extraction member both configured to extract fluid, wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.