Impedance Matching Network for Plasma Chamber Multi-Level Pulsing

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Solution Overview

Problem

Conventional impedance matching networks struggle to efficiently match the dynamic impedance of a plasma load during multi-level pulsing in plasma chambers, as they require significant time to adjust, which is slower than the rapid changes in plasma conditions caused by multi-level pulse signals, leading to suboptimal power delivery and plasma processing.

Innovation Solution

An impedance matching system with a controller that identifies each pulse interval of a multi-level pulse signal and adjusts an electronically switched impedance matching network to iteratively reduce impedance mismatch levels, using a combination of shunt and series capacitors and PIN diodes to quickly match the impedance, with configuration records stored for future intervals.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If conventional impedance matching networks are used to match plasma load impedance, then impedance matching is achieved, but the adjustment speed is too slow to keep up with rapid plasma condition changes during multi-level pulsing

Engineering Contradiction:
Improveimpedance adjustment speedVSAvoidpower transfer efficiency
Core Design Contradiction:
SpeedVSReliability

Solution Approach 1:

The impedance matching network transitions from static mechanical adjustment to dynamic electronic switching. The system uses electronically controlled switches (such as PIN diodes or transistors) to rapidly reconfigure the matching network components, enabling the impedance to be adjusted in real-time according to plasma conditions during multi-level pulsing, thereby achieving both fast response and reliable power transfer

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent replaces mechanical adjustment mechanisms (such as mechanical variable capacitors or inductors) with electronic switching systems. The electronically switched impedance matching network uses solid-state components to achieve rapid impedance transformation, eliminating the mechanical inertia and slow response inherent in conventional systems while maintaining accurate impedance matching for efficient power delivery

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Adaptability or versatility

If multi-level pulse signals are used to tailor plasma characteristics, then plasma customization is improved, but impedance mismatch increases due to rapid plasma condition changes

Engineering Contradiction:
Improveplasma characteristic customizationVSAvoidpower transfer loss
Core Design Contradiction:
Adaptability or versatilityVSLoss of energy

Solution Approach 1:

The system implements a feedback control mechanism where the actual plasma impedance is continuously monitored during multi-level pulsing, and the impedance matching network is dynamically adjusted in response to measured plasma conditions. This closed-loop control ensures that despite rapid plasma characteristic changes, the impedance remains matched, minimizing power loss while maintaining the desired plasma customization

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The impedance matching network is synchronized with the periodic multi-level pulse signal, adjusting its configuration in sync with each pulse level transition. This periodic adaptation allows the system to maintain optimal impedance matching throughout the entire pulse cycle, ensuring efficient power transfer while achieving the desired time-dependent plasma characteristics

Inventive Principle:
Principle #19Periodic action

Data Source

PatentEP4227978A1Impedance matching system and method of operating the same
Publication Date: 2023.08.16 AES GLOBAL HLDG PTE LTD
  • EP4227978A1 patent drawingFigure 1A
  • EP4227978A1 patent drawingFigure 1B
  • EP4227978A1 patent drawingFigure 2A~2B

AI summary

An impedance matching system includes an impedance matching network coupled between an alternating current (AC) generator and electrodes of a plasma chamber. The AC generator generates a multi-level pulse signal of cyclically recurring pulse intervals with differing amplitude levels. A controller identifies each recurring pulse interval, and for each pulse interval, determines an impedance mis-match level between the AC generator and the electrodes, adjusts a configuration of the impedance matching network according to the determined impedance mis-match level, and stores information associated with the adjusted configuration. When an ensuing pulse interval occurs, the controller obtains the stored information from memory, adjusts the configuration of the impedance matching network according to the stored information, determines another impedance mis-match level between the AC generator and the electrodes, and adjusts the configuration of the impedance matching network to iteratively reduce the impedance mismatch level.