Temperature-Tuned Impedance Member for Edge Ring Plasma Uniformity
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Solution Overview
Problem
Substrate processing apparatuses using plasma face issues with non-uniform plasma distribution due to wear of the edge ring, leading to uneven substrate processing and reduced productivity.
Innovation Solution
Incorporating an impedance adjustment member with a temperature-adjustable dielectric constant, made of materials like magnesium oxide, to control plasma distribution uniformly by varying the dielectric constant based on edge ring corrosion, ensuring consistent plasma density across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If plasma processing is performed using a conventional edge ring, then substrate processing can be conducted, but the edge ring wears down causing non-uniform plasma distribution and reduced processing quality
Solution Approach 1:
The patent changes the physical-chemical parameters of the edge ring by using a composite material containing magnesium oxide with specific weight percentages (10-50 wt%). This material composition change provides both wear resistance and appropriate plasma interaction properties, resolving the contradiction between durability and processing uniformity
Solution Approach 2:
The edge ring is constructed as a composite material combining magnesium oxide with other materials in specific proportions. This composite structure provides enhanced wear resistance while maintaining plasma distribution uniformity, simultaneously addressing both reliability and manufacturing precision requirements
2Reliability
If the edge ring is made more wear-resistant, then durability improves, but plasma distribution uniformity may deteriorate due to material properties
Solution Approach 1:
By adjusting the magnesium oxide content parameter within the optimal range of 10-50 wt%, the patent achieves a balance where the material is sufficiently wear-resistant while maintaining the electrical and thermal properties needed for uniform plasma distribution
Solution Approach 2:
The composite material formulation allows combining wear-resistant properties from magnesium oxide with other materials that maintain plasma interaction characteristics, achieving both durability and plasma uniformity simultaneously
3Productivity
If substrate processing continues without maintenance, then productivity increases, but processing quality deteriorates due to edge ring wear
Solution Approach 1:
The enhanced wear resistance of the magnesium oxide composite edge ring enables continuous substrate processing without interruption for maintenance, maintaining both high productivity and processing quality over extended periods
Solution Approach 2:
The improved material properties extend the operational lifecycle of the edge ring, allowing sustained processing operations while maintaining the critical parameters for uniform plasma distribution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures uniform plasma distribution and improved processing efficiency by actively adjusting the dielectric constant of the impedance adjustment member in response to edge ring corrosion, maintaining consistent plasma density and reducing yield reduction caused by tilting phenomena.
Implementation Method 1
an impedance adjustment member provided below the edge ring, and a temperature adjustment member that variably adjusts temperature of the impedance adjustment member
Implementation Method 2
The impedance adjustment member may be made of a material, the dielectric constant of which varies according to temperature
Implementation Method 3
Plasma is generated by heating or subjecting a neutral gas to a strong electric field or a radio frequency (RF) electromagnetic field and refers to an ionized gaseous state of matter containing ions, electrons, and radicals
Implementation Method 4
Plasma is generated by heating or subjecting a neutral gas to a strong electric field or a radio frequency (RF) electromagnetic field and refers to an ionized gaseous state of matter
Implementation Method 5
a temperature adjustment member that variably adjusts temperature of the impedance adjustment member
Implementation Method 6
The impedance adjustment member may have the highest dielectric constant at a first temperature, an increasing dielectric constant with a temperature rise in a range below the first temperature
Data Source
AI summary
The inventive concept relates to an apparatus and a method for processing a substrate. In an embodiment, the apparatus includes a process chamber having a processing space inside, a support unit that supports the substrate in the processing space, a gas supply unit that supplies a process gas into the processing space, and a plasma source that generates plasma from the process gas. The support unit includes a support on which the substrate is placed, an edge ring around the substrate placed on the support, an impedance adjustment member provided below the edge ring, and a temperature adjustment member that variably adjusts temperature of the impedance adjustment member.